Analysis of A1N thin films by combining TOF-ERDA and NRB techniques

Thin Solid Films

Volumn 289, Issue 1-2, 1996, Pages 159-165

  Jokinen, J ^a   Haussalo, P ^a   Keinonen, J ^a   Ritala, M ^a   Riihela D ^a   Leskela M ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

Author keywords

Aluminium nitride; Depth profiling; Nuclear resonance broadening; Time of flight elastic recoil detection analysis

Indexed keywords

ALUMINUM COMPOUNDS; EPITAXIAL GROWTH; GLASS; IMPURITIES; ION BEAMS; OPTIMIZATION;

ALUMINUM NITRIDE THIN FILMS; ATOMIC LAYER EPITAXY; DEPTH PROFILING; HIGH ENERGY ION BEAM TECHNIQUES; LIGHT ATOM IMPURITIES; NUCLEAR RESONANCE BROADENING; TIME OF FLIGHT ELASTIC RECOIL DETECTION ANALYSIS;

THIN FILMS;

EID: 0030286059     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08927-4     Document Type: Article

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