X-ray photoelectron spectroscopy study of TiN films produced with tetrakis(dimethylamido)titanium and selected N-containing precursors on SiO2

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 3, 1998, Pages 1262-1267

  Endle, J P ^a   Sun, Y M ^a   White, J M ^a   Ekerdt, J G ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005547183     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581271     Document Type: Article

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