Chemical bonding and electronic structure of high-k transition metal dielectrics: Applications to interfacial band offset energies and electronically active defects

High-K Gate Dielectrics

Volumn , Issue , 2003, Pages 325-371

  Lucovsky, Gerald ^a   Whitten, Jerry L ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85059733408     PISSN: None     EISSN: None     Source Type: Book    
DOI: None     Document Type: Chapter

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