Fluorine atom induced decreases to the contribution of infrared vibrations to the static dielectric constant of Si-O-F alloy films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 3, 1997, Pages 836-843

  Lucovsky, G ^a   Yang, H ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001453929     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580717     Document Type: Article

References (14)

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