Deposition techniques for SiC MEMS

Silicon Carbide Micro Electromechanical Systems for Harsh Environments

Volumn , Issue , 2006, Pages 18-45

  Zorman, Christian A ^a   Fu, Xiao An ^a   Mehregany, Mehran ^a  

^a Case Western Reserve University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS MATERIALS; DEPOSITION; ELECTROMECHANICAL DEVICES; ION BEAMS; MEMS; POLYCRYSTALLINE MATERIALS; SILICON CARBIDE; SINGLE CRYSTALS; WIDE BAND GAP SEMICONDUCTORS;

DEPOSITION TECHNIQUE; ION BEAM SYNTHESIS; MATERIAL REQUIREMENTS; MEMS APPLICATIONS; MICRO ELECTROMECHANICAL SYSTEM (MEMS); POLYCRYSTALLINE; THERMALLY STABLE; THIN-FILM DEPOSITION TECHNIQUE;

SILICON COMPOUNDS;

EID: 84967430778     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1142/9781860949098_0002     Document Type: Chapter

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