Performance of 3C-SiC thin films as protective coatings for silicon-micromachined atomizers

Thin Solid Films

Volumn 315, Issue 1-2, 1998, Pages 170-178

  Rajan, Narayanan ^a   Zorman, Christian A ^a   Mehregany, Mehran ^a   DeAnna, Russell ^b   Harvey, Rex ^c  

^a Case Western Reserve University   (United States)

^b U S ARMY RESEARCH LABORATORY   (United States)

^c PARKER HANNIFIN CORPORATION   (United States)

Author keywords

Atmospheric pressure chemical vapor deposition; Silicon carbide thin films; Silicon micromachined fuel atomizers

Indexed keywords

ASPECT RATIO; ATOMIZERS; CHEMICAL VAPOR DEPOSITION; MICROMACHINING; REACTIVE ION ETCHING; SILICON CARBIDE; SILICON WAFERS; THIN FILMS;

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION (APCVD);

PROTECTIVE COATINGS;

EID: 0032473232     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00708-6     Document Type: Article

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