Growth of SiC films obtained by LPCVD

Diamond and Related Materials

Volumn 6, Issue 10, 1997, Pages 1306-1310

  Clavaguera Mora, M T ^a   Rodriguez Viejo J ^a   El Felk, Z ^a   Hurtos E ^a   Berberich, S ^a   Stoemenos, J ^b   Clavaguera, N ^c  

^a UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

^b ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

^c UNIVERSITY OF BARCELONA   (Spain)

Author keywords

LPCVD; Metal organic precursors; Microtwins development; Poly SiC

Indexed keywords

EID: 0012983099     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(97)00084-8     Document Type: Article

References (6)

1. R.F. David, G. Kelner, J.W. Palmour, J.A. Edmond, Proc. IEEE 79 (1991) 677.
2. J. Rodriguez, N. Clavaguera, Z. El Felk, M.T. Clavaguera-Mora, G. Arnaud, J. Camasel, J. Pascual, S. Berberich, J. Millán, Mater. Sci. Technol. 12 (1996) 98-101.
3. K.K. Schuegraf (Ed.), Handbook of Thin Film Deposition, Noyes Publishers, Park Ridge, 1988.
4. I. Golecki, F. Reidinger, J. Marti, Appl. Phys. Lett. 60 (1992) 1703.
5. J. Rodríguez Viejo, J. Soemenos, N. Clavaguera, M.T. Clavaguera-Mora, J. Cryst. Growth 155 (1995) 214.
6. A. Tabata, S. Fujii, Y. Suzuoki, T. Mizutani, M. Leda, J. Appl. Physics 23 (1990) 316.