Silicon-based quantum dots: Synthesis, surface and composition tuning with atmospheric pressure plasmas

Journal of Physics D: Applied Physics

Volumn 48, Issue 31, 2015, Pages

  Askari, Sadegh ^a   Macias Montero, Manuel ^a   Velusamy, Tamilselvan ^a   Maguire, Paul ^a   Svrcek, Vladmir ^b   Mariotti, Davide ^a  

^a UNIVERSITY OF ULSTER   (United Kingdom)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

atmospheric pressure plasmas; quantum dots; silicon

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; MATERIALS PROPERTIES; NANOCRYSTALS; SILICON;

ATMOSPHERIC PRESSURE PLASMAS; LASER-BASED METHODS; LOW PRESSURE PLASMA; NANO SCALE; NOVEL MATERIALS; SILICON-BASED; SYNTHESIS METHOD; WET CHEMISTRY;

SEMICONDUCTOR QUANTUM DOTS;

EID: 84937915988     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/48/31/314002     Document Type: Article

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