Nanoparticle deposition in hydrogenated amorphous silicon films during rf plasma deposition

Applied Physics Letters

Volumn 68, Issue 12, 1996, Pages 1705-1707

  Tanenbaum, D M ^a   Laracuente, A L ^a   Gallagher, Alan ^a  

^a UNIVERSITY OF COLORADO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001206090     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.115912     Document Type: Article

References (22)

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