Synthesis of high purity silicon nanoparticles in a low pressure microwave reactor

Journal of Nanoscience and Nanotechnology

Volumn 4, Issue 8, 2004, Pages 1039-1044

  Knipping, Jörg ^a   Wiggers, Hartmut ^a   Rellinghaus, Bernd ^a   Roth, Paul ^a   Konjhodzic, Denan ^a   Meier, Cedrik ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

EELS; FTIR; HRTEM; Low Pressure Flame; Microwave Plasma; Nanoparticles; Silicon; XRD

Indexed keywords

AMORPHOUS OXIDE SHELL; LOW-PRESSURE FLAMES; MICROWAVE PLASMA; MICROWAVE REACTOR; PARTICLE MASS SPECTROMETRY (PMS);

CONCENTRATION (PROCESS); CRYSTAL STRUCTURE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LOW PASS FILTERS; MASS SPECTROMETRY; MICROWAVES; SILICON; SYNTHESIS (CHEMICAL); TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

NANOSTRUCTURED MATERIALS;

NANOTUBE; SILICON;

ARTICLE; CHEMISTRY; COMPARATIVE STUDY; CONFORMATION; CRYSTALLIZATION; FLOW INJECTION ANALYSIS; MATERIALS TESTING; METHODOLOGY; MICROWAVE RADIATION; NANOTECHNOLOGY; PARTICLE SIZE; PRESSURE; ULTRASTRUCTURE;

CRYSTALLIZATION; FLOW INJECTION ANALYSIS; MATERIALS TESTING; MICROWAVES; MOLECULAR CONFORMATION; NANOTECHNOLOGY; NANOTUBES; PARTICLE SIZE; PRESSURE; SILICON;

EID: 11244310093     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2004.149     Document Type: Article

References (30)

1. L. T. Canham, Appl. Phys. Lett. 57, 1046 (1990).
2. V. Lehman and U. Gösele, Appl. Phys. Lett. 58, 856 (1990).
3. H. Takagi, H. Ogawa, Y. Yamazaki, A. Ishizaki, and T. Nakagiri, Appl. Phys. Lett. 56, 2379 (1990).
4. A. G. Cullis and L. T. Canham, Nature 353, 335 (1991).
5. L. N. Dinh, L. L. Chase, M. Balooch, W. J. Siekhaus, and F. Wooten, Phys. Rev. B 54, 5029 (1996).
6. T. van Buren, L. N. Dinh, L. L. Chase, W. J. Siekhaus, and L. J. Terminello, Phys. Rev. Lett. 80, 3803 (1998).
7. A. G. Cullis, L. T. Canham, and P. D. J. Calcott, J. Appl. Phys. 82, 909 (1997).
8. G. Ledoux, O. Guillois, D. Porterat, C. Reynaud, F. Huisken, B. Kohn, and V. Paillard, Phys. Rev. B 62, 15942 (2000).
9. T. Yoshida, Y. Yamada, and T. Orii, J. Appl. Phys. 83, 5427 (1998).
10. J. M. Martínez-Duart and R. J. Martín-Palma, Phys. Stat. Sol. B 232, 81 (2002).
11. F. Huisken, H. Hofmeister, B. Kohn, M. A. Laguna, and V. Paillard, Appl. Surf. Sci. 154, 305 (1999).
12. H. Wiggers, R. Starke, and P. Roth, Chem. Eng. Technol. 24, 261 (2001).
13. H. Hofmeister, P. Ködderitzsch, and J. Dutta, J. Non-Crystalline Solids 232, 182 (1998).
14. J. Dutta, W. Basca, and Ch. Hollenstein, J. Appl. Phys. 77, 3729 (1995).
15. C. Courteille, J.-L. Dorier, J. Dutta, Ch. Hollenstein, A. A. Howling, and T. Stoto, J. Appl. Phys. 78, 61 (1995).
16. H. Hofmeister, F. Huisken, and B. Kohn, Eur. Phys. J. D. 9, 137 (1999).
17. M. J. Caldas, Phys. Stat. Sol. B 217, 641 (2000).
18. L. Pavesi, L. dal Negro, C. Mazzoleni, G. Franzò, and F. Priolo, Nature 408, 440 (2000).
19. P. Roth and A. Hospital, J. Aerosol Sci. 25, 61 (1994).
20. C. G. Granqvist and R. A. Buhrman, J. Appl. Phys. 47, 2200 (1976).
21. B. E. Warren, X-ray Diffraction, Dover Publications, Inc., New York 253 (1969).
22. B. Rellinghaus, S. Stappert, E. F. Wassermann, H. Sauer, and B. Spliethoff, Eur. Phys. J. D. 16, 249 (2001).
23. O. L. Krivanek and C. C. Ahn, Gatan EELS Adas.
24. H. Zhang, A. Wei, S. Liu, W. Wang, D. Chen, L. Liang, and K. Chen, Thin Solid Films 368, 315 (2000).
25. T. M. Kramer, W. E. Rhine, and H. K. Bowen, Adv. Ceram. Mater. 3, 244 (1988).
26. N. Nagai, K. Terada, Y. Muraji, H. Hashimoto, T. Maeda, Y. Maeda, E. Tahara, N. Tokai, and A. Hatta, J. Appl. Phys. 91, 4747 (2002); R. A. B. Devine, Appl. Phys. Lett. 68, 3108 (1996).
27. N. Nagai, K. Terada, Y. Muraji, H. Hashimoto, T. Maeda, Y. Maeda, E. Tahara, N. Tokai, and A. Hatta, J. Appl. Phys. 91, 4747 (2002); R. A. B. Devine, Appl. Phys. Lett. 68, 3108 (1996).
28. A. Borghesi, A. Piaggi, A. Sassela, A. Stella, and B. Pivac, Phys. Rev. B 46, 4123 (1992).
29. A. von Keudell and J. R. Abelson, Phys. Rev. B 59, 5791 (1999).
30. J. Snipping, H. Wiggers, and P. Roth, to be published.