Crystalline Si nanoparticles below crystallization threshold: Effects of collisional heating in non-thermal atmospheric-pressure microplasmas

Applied Physics Letters

Volumn 104, Issue 16, 2014, Pages

  Askari, S ^a   Levchenko, I ^b,c   Ostrikov, K ^b,c,d   Maguire, P ^a   Mariotti, D ^a  

^a UNIVERSITY OF ULSTER   (United Kingdom)

^b CSIRO   (Australia)

^c UNIVERSITY OF SYDNEY   (Australia)

^d QUEENSLAND UNIVERSITY OF TECHNOLOGY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; HEAT FLUX; METAMATERIALS; NANOPARTICLES; PLASMA DEVICES; SILICON;

CRYSTALLINE SILICONS; CRYSTALLIZATION THRESHOLD; LOW GAS TEMPERATURE; LOW TEMPERATURES; NANOPARTICLE SURFACE; NUCLEATION AND GROWTH; SI NANOPARTICLES; STRUCTURE CONTROL;

ATMOSPHERIC TEMPERATURE;

EID: 84900326572     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4872254     Document Type: Article

References (40)

1. E. D. Sargent, Nat. Photonics 6, 133 (2012). 10.1038/nphoton.2012.33
2. Y. Shirasaki, G. J. Supran, M. G. Bawendi, and V. Bulović, Nat. Photonics 7, 13 (2013). 10.1038/nphoton.2012.328
3. J. Fan and P K. Chu, Small 6, 2080 (2010). 10.1002/smll.201000543
4. D. K. Kim, Y. Lai, B. T. Diroll, C. B. Murray, and C. R. Kagan, Nature Commun. 3, 1216 (2012). 10.1038/ncomms2218
5. D. Mariotti, S. Mitra, and V. Švrček, Nanoscale 5, 1385 (2013). 10.1039/c2nr33170e
6. V. Švrček, M. Kondo, K. Kalia, and D. Mariotti, Chem. Phys. Lett. 478, 224 (2009). 10.1016/j.cplett.2009.07.090
7. V. Švrček, D. Mariotti, and M. Kondo, Appl. Phys. Lett. 97, 161502 (2010). 10.1063/1.3505329
8. K. Ostrikov, E. C. Neyts, and M. Meyyappan, Adv. Phys. 62, 113 (2013). 10.1080/00018732.2013.808047
9. D. Mariotti and K. Ostrikov, J. Phys. D: Appl. Phys. 42, 092002 (2009). 10.1088/0022-3727/42/9/092002
10. D. Mariotti and R. M. Sankaran, J. Phys. D: Appl. Phys. 43, 323001 (2010). 10.1088/0022-3727/43/32/323001
11. T. Belmonte, G. Arnoult, G. Henrion, and T. Gries, J. Phys. D: Appl. Phys. 44, 363001 (2011). 10.1088/0022-3727/44/36/363001
12. W.-H. Chiang, C. Richmonds, and R. M. Sankaran, Plasma Sources Sci. Technol. 19, 034011 (2010). 10.1088/0963-0252/19/3/034011
13. R. M. Sankaran, D. Holunga, R. C. Flagan, and K. P. Giapis, Nano Lett. 5, 537 (2005). 10.1021/nl0480060
14. T. Nozaki, K. Sasaki, T. Ogino, D. Asahi, and K. Okazaki, Nanotechnology 18, 235603 (2007). 10.1088/0957-4484/18/23/235603
15. S. Q. Xiao and S. Xu, J. Phys. D: Appl. Phys. 44, 174033 (2011). 10.1088/0022-3727/44/17/174033
16. F. Priolo, T. Gregorkiewicz, M. Galli, and T. F. Krauss, Nat. Nanotechnol. 9, 19 (2014). 10.1038/nnano.2013.271
17. A. J. Nozik, Nano Lett. 10, 2735 (2010). 10.1021/nl102122x
18. L. Mangolini and U. Kortshagen, Phys. Rev. E 79, 026405 (2009). 10.1103/PhysRevE.79.026405
19. J. E. Daugherty and D. B. Graves, J. Vac. Sci. Technol., A 11, 1126 (1993). 10.1116/1.578452
20. G. H. P. M. Swinkels, H. Kersten, H. Deutsch, and G. M. W. Kroesen, J. Appl. Phys. 88, 1747 (2000). 10.1063/1.1302993
21. H. R. Maurer and H. Kersten, J. Phys. D: Appl. Phys. 44, 174029 (2011). 10.1088/0022-3727/44/17/174029
22. S. Hofmann, A. F. H. van Gessel, T. Verreycken, and P. Bruggeman, Plasma Sources Sci. Technol. 20, 065010 (2011). 10.1088/0963-0252/20/6/065010
23. S. Y. Moon and W. Choe, Spectrochim. Acta, Part B 58, 249 (2003). 10.1016/S0584-8547(02)00259-8
24. J. Luque and D. R. Crosley, SRI International Report No. MP-99-009, 1999.
25. S. G. Belostotskiy, T. Ouk, V. M. Donnelly, D. J. Economou, and N. Sadeghi, J. Appl. Phys. 107, 053305 (2010). 10.1063/1.3318498
26. S. Namba, T. Yamasaki, Y. Hane, D. Fukuhara, K. Kozue, and K. Takiyama, J. Appl. Phys. 110, 073307 (2011). 10.1063/1.3646551
27. X.-M. Zhu, W.-C. Chen, and Y.-K. Pu, J. Phys. D: Appl. Phys. 41, 105212 (2008). 10.1088/0022-3727/41/10/105212
28. J. E. Allen, Phys. Scr. 45, 497 (1992). 10.1088/0031-8949/45/5/013
29. S. V. Vladimirov, K. N. Ostrikov, M. Y. Yu, and L. Stenflo, Phys. Rev. E 58, 8046 (1998). 10.1103/PhysRevE.58.8046
30. M. Keidar, O. R. Monteiro, A. Anders, and I. D. Boyd, Appl. Phys. Lett. 81, 1183 (2002). 10.1063/1.1499516
31. M. Lampe, V. Gavrishchaka, G. Ganguli, and G. Joyce, Phys. Rev. Lett. 86, 5278 (2001). 10.1103/PhysRevLett.86.5278
32. A. V. Zobnin, A. P. Nefedov, V. A. Sinelshchikov, and V. E. Fortov, J. Exp. Theor. Phys. 91, 483 (2000). 10.1134/1.1320081
33. S. A. Khrapak, S. V. Ratynskaia, A. V. Zobnin, A. D. Usachev, V. V. Yaroshenko, M. H. Thoma, M. Kretschmer, H. Hofner, G. E. Morfill, O. F. Petrov, and V. E. Fortov, Phys. Rev. E 72, 016406 (2005). 10.1103/PhysRevE.72.016406
34. M. Gatti and U. Kortshagen, Phys. Rev. E 78, 046402 (2008). 10.1103/PhysRevE.78.046402
35. S. A. Khrapak and G. E. Morfill, Phys. Plasmas 15, 114503 (2008). 10.1063/1.3035913
36. L. G. D'yachkov, A. G. Khrapak, S. A. Khrapak, and G. E. Morfill, Phys. Plasmas 14, 042102 (2007). 10.1063/1.2713719
37. F. Liu, K. J. Daun, D. R. Snelling, and G. J. Smallwood, Appl. Phys. B 83, 355 (2006). 10.1007/s00340-006-2194-1
38. W. M. Trott, J. N. Castañeda, J. R. Torczynski, M. A. Gallis, and D. J. Rader, Rev. Sci. Instrum. 82, 035120 (2011). 10.1063/1.3571269
39. M. Hirasawa, T. Orii, and T. Seto, Appl. Phys. Lett. 88, 093119 (2006). 10.1063/1.2182018
40. http://dx.doi.org/10.1063/1.4872254 E-APPLAB-104-003417 for further analysis of chemical and optical properties of Si nanoparticles.