Creating ligand-free silicon germanium alloy nanocrystal inks

ACS Nano

Volumn 5, Issue 10, 2011, Pages 7950-7959

  Erogbogbo, Folarin ^c   Liu, Tianhang ^a,c,d   Ramadurai, Nithin ^b   Tuccarione, Phillip ^b   Lai, Larry ^c   Swihart, Mark T ^b   Prasad, Paras N ^c,d  

^a CHANGCHUN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b State University of New York   (United States)

^c UNIVERSITY AT BUFFALO   (United States)

^d Changchun University of Science and Technology   (China)

Author keywords

aerosol; alloy nanoparticles; germanium; nanoparticles; silicon

Indexed keywords

ALLOY NANOPARTICLE; BAND GAP ENGINEERING; BULK SEMICONDUCTORS; CATALYTIC PROPERTIES; DEVICE FABRICATIONS; FTIR; LASER PYROLYSIS; LIGAND-FREE; LOW COST FABRICATION; ORGANIC SURFACTANTS; PATTERNED FILMS; PHOTOVOLTAIC DEVICES; SEMICONDUCTOR NANOCRYSTALS; SI-GE ALLOYS; SILICON-GERMANIUM ALLOYS; TOF SIMS; XRD;

BICMOS TECHNOLOGY; CERIUM ALLOYS; GERMANIUM; GERMANIUM ALLOYS; HETEROJUNCTION BIPOLAR TRANSISTORS; INK; LIGANDS; NANOCRYSTALS; NANOPARTICLES; PHOTOVOLTAIC EFFECTS; PYROLYSIS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; SILICON ALLOYS; SURFACE ACTIVE AGENTS;

NANOCRYSTALLINE ALLOYS;

ALLOY; GERMANIUM; HYDROGEN; INK; LIGAND; NANOPARTICLE; SILICON; SOLVENT;

ARTICLE; CHEMISTRY; COLLOID; LASER; METHODOLOGY; NANOTECHNOLOGY; SURFACE PROPERTY;

ALLOYS; COLLOIDS; GERMANIUM; HYDROGEN; INK; LASERS; LIGANDS; NANOPARTICLES; NANOTECHNOLOGY; SILICON; SOLVENTS; SURFACE PROPERTIES;

EID: 80055014597     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn2023304     Document Type: Article

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