Formation of single-crystal spherical particle architectures by plasma-induced low-temperature coalescence of silicon nanocrystals synthesized by laser ablation in water

Journal of Physical Chemistry C

Volumn 115, Issue 14, 2011, Pages 6235-6242

  Švrček, Vladimir ^a   Mariotti, Davide ^b,c   Kalia, Keerti ^c   Dickinson, Calum ^d   Kondo, Michio ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b UNIVERSITY OF ULSTER   (United Kingdom)

^c Rochester Institute of Technology   (United States)

^d UNIVERSITY OF LIMERICK   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

GAS CONCENTRATION; HYDROXYL-TERMINATED; LOW TEMPERATURES; PHOTOLUMINESCENCE PROPERTIES; PLASMA PROCESS; PLASMA-INDUCED; SELF-ORGANIZED; SILICON NANOCRYSTALS; SINGLE-CRYSTAL SI; SPHERICAL PARTICLE; SURFACE CHARACTERISTICS; SURFACE STATE; TUNNELING PROBABILITIES;

COALESCENCE; LASER ABLATION; LASER APPLICATIONS; MONOCRYSTALLINE SILICON; NANOCRYSTALS; SINGLE CRYSTAL SURFACES; SPHERES;

AGGLOMERATION;

EID: 79953733710     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp111387q     Document Type: Article

References (54)

1. Grom, G.; Lockwood, D.; McCaffrey, J.; Labbe, H.; Fauchet, P.; White, B., Jr.; Dlenner, J.; Kovalev, D.; Koch, F.; Tsybeskov, L. Nature 2000, 407, 358
2. Kanemitsu, Y.; Uto, H.; Masumoto, Y.; Matsumoto, T.; Futagi, T.; Mimura, H. Phys. Rev. B 1993, 48, 2827
3. Maier, S. A.; Kik, P. G.; Atwater, H. A.; Meltzer, S.; Harel, E.; Koel, B. E.; Requicha, A. A. G. Nat. Mater. 2003, 2, 229
4. Dekker, K.; Cees, L. Phys. Today 1999, 52, 22
5. Martel, R.; Derycke, V.; Lavoie, C.; Appenzeller, J.; Chan, K. K.; Tersoff, J.; Avouris, Ph. Phys. Rev. Lett. 2001, 87, 256805
6. Collins, C.; Philip, G.; Avouris, Ph. Sci. Am. 2000, 67, 69
7. Mintmire, J. W.; Dunlap, B. I.; White, C. T. Phys. Rev. Lett. 1992, 68, 631
8. Sankaran, R. M.; Holunga, D.; Flagan, R. C.; Giapis, K. P. Nano Lett. 2005, 5, 537
9. Xu, S.; Levchenko, I.; Huang, S. Y.; Ostrikov, K. Appl. Phys. Lett. 2009, 95, 111505
10. Yang, Y.; Meng, G.; Liu, X.; Zhu, X.; Kong, M.; Han, F.; Zhao, X.; Xu, Q.; Zhang, L. Cryst. Growth Des. 2008, 8, 1818
11. Mangolini, L.; Thimsen, E.; Kortshagen, U. Nano Lett. 2005, 5, 655
12. Teubner, T.; Heimburger, R.; Böttcher, K.; Boeck, T.; Fornari, R. Cryst. Growth Des. 2008, 8, 2484
13. Beard, M. C.; Knutsen, K. P.; Yu, P.; Luther, J. M.; Song, Q.; Metzger, W. K.; Ellington, R. J.; Nozik, A. J. Nano Lett. 2007, 7, 2506
14. Ganesh, R. B.; Matsuo, H.; Kanagawa, Y.; Arafune, K.; Ohshita, Y.; Yamaguchi, M.; Kakimoto, K. Cryst. Growth Des. 2008, 8, 2525
15. Huang, S. Y.; Das Arulsamy, A.; Xu, M.; Xu, S.; Cvelbar, U.; Mozetic, M.; Ostrikov, K. Phys. Plasmas 2009, 16, 123504
16. Cheng, Q.; Xu, S.; Huang, S.; Ostrikov, K. Cryst. Growth Des. 2009, 9, 2863
17. Švrcek, V.; Sasaki, T.; Shimizu, Y.; Koshizaki, N. J. Laser Micro/Nanoeng. 2007, 2, 15
18. Okamoto, C.; Minemoto, T.; Murozono, M.; Takakura, H.; Hamakawa, Y. Jpn. J. Appl. Phys. 2005, 44, 7805
19. Godefroo, S.; Hayne, M.; Jivanescu, M.; Stesmans, A.; Zacharias, M.; Lebedev, O. I.; Van Tendeloo, G.; Moschchalkov, V. V. Nature 2008, 3, 174
20. Warner, J. H.; Hoshino, A.; Yamamoto, K.; Tilley, R. D. Angew. Chem., Int. Ed. 2005, 44, 4550
21. Holm, J.; Roberts, J. T. J. Phys. Chem. C 2009, 113, 15955
22. Hawa, T.; Zachariah, M. R. Phys. Rev. B 2005, 71, 165434
23. Švrček, V.; Mariotti, D.; Kondo, M. Opt. Express 2009, 17, 520
24. Švrcek, V.; Sasaki, T.; Shimizu, Y.; Koshizaki, N. Chem. Phys. Lett. 2006, 429, 483
25. Švrček, V.; Mariotti, D.; Kalia, K.; Kondo, M. Chem. Phys. Lett. 2009, 478, 224
26. Xu, D.; Sun, L.; Li, H.; Zhang, L.; Guo, G.; Zhao, X.; Gui, L. New J. Chem. 2003, 27, 300
27. Sun, X. H.; Wang, S. D.; Wong, N. B.; Ma, D. D. D.; Lee, S. T. Inorg. Chem. 2003, 42, 2398
28. Gupta, A.; Swihart, M. T.; Wiggers, H. Adv. Funct. Mater. 2009, 19, 696
29. Lucovsky, G.; Manitini, M. J.; Srivastava, J. K.; Irene, E. A. J. Vac. Sci. Technol., B 1987, 5, 530
30. Švrcek, V.; Sasaki, T.; Shimizu, Y.; Koshizaki, N. Appl. Phys. Lett. 2006, 89, 213113
31. Fowlkes, J. D.; Wu, Y.; Rack, P. D. ACS Appl. Mater. Interfaces 2010, 2, 2153
32. Mariotti, D.; Švrček, V.; Mathur, A.; Dickinson, C.; Shibata, Y.; Kondo, M. The 3rd International Symposium on Organic and Inorganic Electronic Materials and Related Nanotechnologies, Toyama, Japan, 22-25 June, 2010.
33. Neyts, E.; Eckert, M.; Mao, M.; Bogaerts, A. Plasma Phys. Controlled Fusion 2009, 51, 124034
34. Benedikt, J. J. Phys. D: Appl. Phys. 2010, 43, 043001
35. Baby, A.; Mahony, C. M. O.; Maguire, P. D. Plasma Sources Sci. Technol., in press.
36. Baby, A.; Mahony, C. M. O.; Maguire, P. D. Plasma Sources Sci. Technol., in press.
37. Inagaki, M. Carbon 1997, 35, 711
38. Li, Y.-L.; Ishigaki, T. J. Ceram. Soc. Jpn. 1997, 35, 711
39. McGorty, R.; Fung, J.; Kaz, D.; Manoharan, V. N. Mater. Today 2010, 13, 34
40. Levchenko, I.; Ostrikov, K.; Mariotti, D.; Švrček, V. Carbon 2009, 47, 2379
41. Li, B.; Yu, D.; Zhang, S.-L. Phys. Rev. B 1999, 59, 1645
42. Buda, F.; Kohanoff, J.; Parrinello, M. Phys. Rev. Lett. 1992, 69, 1272
43. Sauders, G. D.; Chang, Y. C. Phys. Rev. B 1992, 45, 9202
44. Tsu, R.; Shen, H.; Dutta, M. Appl. Phys. Lett. 1992, 60, 112
45. Zhang, S.-L.; Ding, W.; Yan, Y.; Qu, J.; Li, B.; Li, L.-y.; Yue, K. T.; Yu, D. Appl. Phys. Lett. 2002, 81, 4446
46. Brongersma, M. L.; Kik, P. G.; Polman, A.; Min, K. S.; Alwater, H. A. Appl. Phys. Lett. 2000, 76, 351
47. Konstantinov, A. O.; Henry, A.; Harris, C. Z.; Janzen, E. Appl. Phys. Lett. 1995, 66, 2250
48. Jessensky, O.; Muller, F.; Gosele, U. Thin Solid Films 1997, 297, 224
49. Sun, C. Q.; Wang, Y.; Tay, B. K.; Li, S.; Huang, H.; Zhang, Y. B. J. Phys. Chem. B 2002, 106, 10701
50. Romanyuk, B. N.; Klyuoe, N. I.; Kryuger, D. Optoélektron. Poluprovodn. Tekh. 1996, 31, 159
51. Allan, G.; Delerue, C.; Lannoo, M. Phys. Rev. Lett. 1996, 76, 2961
52. Nayfeh, M. H.; Rigakis, N.; Yamani, Z. Phys. Rev. B 1997, 56, 2079
53. Ganichev, S. D.; Yassievich, I. N.; Prettl, W. Fiz. Tverd. Tela 1997, 39, 1905
54. Phys. Solid State 1997, 39, 1703.