Nonthermal plasma synthesized freestanding silicon-germanium alloy nanocrystals

Nanotechnology

Volumn 20, Issue 29, 2009, Pages

  Pi, X D ^a,b,c   Kortshagen, U ^a  

^a University of Minnesota   (United States)

^b ZHEJIANG UNIVERSITY   (China)

^c ZHEJIANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FRACTIONS; BAND GAPS; CORE-SHELL NANOCRYSTALS; GE NANOCRYSTALS; NANOCRYSTAL SIZES; NONTHERMAL PLASMA; OXIDATION KINETICS; SI NANOCRYSTAL; SILICON-GERMANIUM ALLOYS;

ATOMS; GERMANIUM; GERMANIUM ALLOYS; NANOCRYSTALS; OXIDATION; PLASMAS; SILICON; SILICON ALLOYS;

NANOCRYSTALLINE ALLOYS;

ALLOY; GERMANIUM; HYDROGEN; NANOCRYSTAL; SILICON; HYDROFLUORIC ACID; METAL NANOPARTICLE;

ARTICLE; ATOMIC ABSORPTION; CHEMICAL COMPOSITION; CHEMICAL STRUCTURE; CONTROLLED STUDY; HYDROSILYLATION; INFRARED RADIATION; NANOFABRICATION; OXIDATION KINETICS; PARTICLE SIZE; PHOTOLUMINESCENCE; PRIORITY JOURNAL; REACTOR; CHEMISTRY; GAS; INFRARED SPECTROSCOPY; METHODOLOGY; NANOTECHNOLOGY; PHASE TRANSITION; RAMAN SPECTROMETRY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

ALLOYS; GASES; GERMANIUM; HYDROFLUORIC ACID; METAL NANOPARTICLES; MICROSCOPY, ELECTRON, TRANSMISSION; NANOTECHNOLOGY; PHASE TRANSITION; SILICON; SPECTROSCOPY, FOURIER TRANSFORM INFRARED; SPECTRUM ANALYSIS, RAMAN; X-RAY DIFFRACTION;

EID: 67651173070     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/29/295602     Document Type: Article

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