Photosensitive self-assembled nanoarchitectures containing surfactant-free Si nanocrystals produced by laser fragmentation in water

Chemical Physics Letters

Volumn 478, Issue 4-6, 2009, Pages 224-229

  Švrček, Vladimir ^a   Kondo, Michio ^a   Kalia, Keerti ^b   Mariotti, Davide ^b,c  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b Rochester Institute of Technology   (United States)

^c UNIVERSITY OF ULSTER   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON AD-ATOMS; COMPLEX INTERACTION; ELECTRICAL CONDUCTIVITY; ENVIRONMENTAL-FRIENDLY; LASER FRAGMENTATION; LONG RANGE; NANOARCHITECTURES; NANOSECOND LASERS; SCALABLE METHODS; SELF ASSEMBLED STRUCTURES; SELF-ASSEMBLED; SELF-ASSEMBLY; SILICON NANOCRYSTALS; SURFACTANT-FREE;

ELECTRIC CONDUCTIVITY; HEAT TREATMENT; LIGHT SENSITIVE MATERIALS; NANOCLUSTERS; NANOCRYSTALS; PHOTOSENSITIVITY; PLASMA DEPOSITION; SCALABILITY; SURFACE ACTIVE AGENTS;

SILICON;

EID: 68949090465     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cplett.2009.07.090     Document Type: Article

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