Deposition, milling, and etching with a focused helium ion beam

Nanofabrication: Techniques and Principles

Volumn 9783709104248, Issue , 2012, Pages 275-300

  Alkemade, P F A ^a   Van Veldhoven, E ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b TNO   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRON EMISSION; ETCHING; HELIUM; ION BEAMS; ION MICROSCOPES; MILLING (MACHINING); NANOTECHNOLOGY; SECONDARY EMISSION; SLAB MILLS;

DOMINANT MECHANISM; ELECTRON BEAM DEPOSITIONS; HELIUM ION BEAMS; HELIUM ION MICROSCOPES; HIGH SPATIAL RESOLUTION; NANOSCALE MANUFACTURING; SECONDARY ELECTRON EMISSIONS; THEORETICAL STUDY;

IONS;

EID: 84930909518     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1007/978-3-7091-0424-8_11     Document Type: Chapter

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