Precision material modification and patterning with He ions

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2755-2758

  Bell, David C ^a   Lemme, Max C ^a   Stern, Lewis A ^b   Marcus, Charles M ^a  

^a HARVARD UNIVERSITY   (United States)

^b Carl Zeiss Vision Inc USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER; DEVICE FABRICATIONS; GRAPHENES; HELIUM ION; MATERIAL MODIFICATIONS; NANOPATTERNING; PATTERN GENERATION; POTENTIAL TECHNIQUES; SHARP EDGES;

ETCHING; GRAPHITE; HELIUM; MATERIALS SCIENCE; SILICON COMPOUNDS;

IONS;

EID: 72849134922     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3237113     Document Type: Conference Paper

References (10)

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