SCOPUS 정보 검색 플랫폼

Microelectronic Engineering

Volumn 88, Issue 8, 2011, Pages 2452-2455

Focused helium ion beam milling and deposition

(5) Boden, S A a Moktadir, Z a Bagnall, D M a Mizuta, H a Rutt, H N a

a UNIVERSITY OF SOUTHAMPTON (United Kingdom)

Author keywords

Beam induced deposition; Focused ion beam; Gas injection system; Graphene; Helium ion microscope

Indexed keywords

BEAM-INDUCED DEPOSITION; CONTACT DESIGN; CONTROLLED DEPOSITION; FINE FEATURE; FOCUSED ION BEAM TECHNOLOGY; FOUR-POINT; GAS INJECTION SYSTEM; GASEOUS PRECURSORS; GRAPHENE LATTICES; HELIUM ION BEAMS; NANOELECTRONIC DEVICES; NANOSCALE DEVICE FABRICATION; PATTERN GENERATOR; PLATINUM WIRE;

ATOMIC FORCE MICROSCOPY; BEAM PLASMA INTERACTIONS; FOCUSED ION BEAMS; GRAPHENE; HELIUM; ION BOMBARDMENT; ION MICROSCOPES; MILLING (MACHINING); NANOELECTRONICS; PLATINUM; SILICON COMPOUNDS; TUNGSTEN;

IONS;

EID: 79960064811 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2010.11.041 Document Type: Conference Paper

Times cited : (62)

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