Beam induced deposition of platinum using a helium ion microscope

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2660-2667

  Sanford, Colin A ^a   Stern, Lewis ^a   Barriss, Louise ^a   Farkas, Lou ^a   DiManna, Mark ^a   Mello, Russ ^a   Maas, Diederik J ^b   Alkemade, Paul F A ^c  

^a Carl Zeiss Vision Inc USA   (United States)

^b TNO   (Netherlands)

^c DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM CURRENTS; BEAM-INDUCED DEPOSITION; CIRCUIT EDIT; CONTROLLABLE PARAMETERS; DEPOSITED FILMS; DEPOSITION CHARACTERISTICS; ELECTRICAL PROPERTY; FOCUSED ION BEAM TECHNOLOGY; HELIUM ION; INTERACTION CHARACTERISTICS; NANOFABRICATION; ORGANOMETALLIC PRECURSORS;

ELECTRIC PROPERTIES; HELIUM; ION MICROSCOPES; ORGANOMETALLICS; PLATINUM; RADIOACTIVITY;

IONS;

EID: 72849106874     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3237095     Document Type: Conference Paper

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