On the influence of the sputtering in determining the resolution of a scanning ion microscope

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 3196-3202

  Castaldo, V ^a   Hagen, C W ^a   Kruit, P ^a   Van Veldhoven, E ^b   Maas, D ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b TNO   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

FOCUSED-ION-BEAM SYSTEM; FUNDAMENTAL LIMITS; LIGHT IONS; LIMITING FACTORS; LOW MASS; NOT GIVEN; SCANNING ION MICROSCOPES; SCANNING ION MICROSCOPY; SCANNING MICROSCOPY; SMALL FEATURES; SPOT SIZES; THREE PARAMETERS;

HELIUM; HIGH ENERGY PHYSICS; ION BEAMS; ION MICROSCOPES; OPTOELECTRONIC DEVICES; SCANNING; SIGNAL TO NOISE RATIO; TIN;

IONS;

EID: 72849124304     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3253549     Document Type: Conference Paper

References (8)

1. A. Vladár, M. Postek, and B. Ming, Microscopy Today 17, 2 (2009).
2. E. Kieft and E. Bosch, J. Phys. D: Appl. Phys. 41, 215310 (2008).
3. J. Orloff, L. W. Swanson, and M. Utlaut, J. Vac. Sci. Technol. B 14, 3759 (1996).
4. M. Sato, in Handbook of Charged Particle Optics, edited by, J. Orloff, (CRC, Boca Raton, FL, 2009), Chap., pp. 391-436.
5. M. Sato and J. Orloff, Ultramicroscopy 41, 181 (1992).
6. V. Castaldo, C. W. Hagen, B. Rieger, and P. Kruit, J. Vac. Sci. Technol. B 26, 2107 (2008).
7. J. Orloff, Proc. SPIE 2522, 412 (1995).
8. SRIM/TRIM reference website: http://www.srim.org/.