Platinum-enhanced electron transfer and surface passivation through ultrathin film aluminum oxide (Al2O3) on Si(111)-CH3 photoelectrodes

ACS Applied Materials and Interfaces

Volumn 7, Issue 16, 2015, Pages 8572-8584

  Kim, Hark Jin ^a   Kearney, Kara L ^a   Le, Luc H ^a   Pekarek, Ryan T ^a   Rose, Michael J ^a  

^a University of Texas at Austin   (United States)

Author keywords

Al2O3 passivation; atomic layer deposition; electron transport; methyl passivated Si(111); platinum (Pt) ALD

Indexed keywords

ALUMINA; ALUMINUM COATINGS; ATOMIC LAYER DEPOSITION; CYCLIC VOLTAMMETRY; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTROLYTES; ELECTRON TRANSITIONS; ELECTRON TRANSPORT PROPERTIES; FILM PREPARATION; OXIDE FILMS; PASSIVATION; PHOTOELECTROCHEMICAL CELLS; PLATINUM; SURFACE DEFECTS; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

AQUEOUS ELECTROLYTE; ELECTRON TRANSPORT; HIGH-ELECTRONIC-QUALITY; IMPEDANCE MEASUREMENT; PHOTO-ELECTROCHEMISTRY; PHOTOELECTROCHEMICALS; SI (1 1 1); SURFACE RECOMBINATION VELOCITIES;

ALUMINUM OXIDE;

EID: 84928818531     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/acsami.5b00376     Document Type: Article

References (59)

1. Du, P.; Eisenberg, R. Catalysts Made of Earth-Abundant Elements (Co, Ni, Fe) for Water Splitting: Recent Progress and Future Challenges Energy Environ. Sci. 2012, 5, 6012-6021
2. Mayer, M. T.; Lin, Y.; Yuan, G.; Wang, D. Forming Heterojunctions at the Nanoscale for Improved Photoelectrochemical Water Splitting by Semiconductor Materials: Case Studies on Hematite Acc. Chem. Res. 2013, 46, 1558-1566
3. Newman, J.; Hoertz, P. G.; Bonino, C. A.; Trainham, J. A. Review: An Economic Perspective on Liquid Solar Fuels J. Electrochem. Soc. 2012, 159, A1722-A1729
4. Kenney, M. J.; Gong, M.; Li, Y.; Wu, J. Z.; Feng, J.; Lanza, M.; Dai, H. High-Performance Silicon Photoanodes Passivated with Ultrathin Nickel Films for Water Oxidation Science 2013, 342, 836-840
5. Dominey, R. N.; Lewis, N. S.; Bruce, J. A.; Bookbinder, D. C.; Wrighton, M. S. Improvement of Photoelectrochemical Hydrogen Generation by Surface Modification of p-Type Silicon Semiconductor Photocathodes J. Am. Chem. Soc. 1982, 104, 467-482
6. Bansal, A.; Li, X.; Lauermann, I.; Lewis, N. S.; Yi, S. I.; Weinberg, W. H. Alkylation of Si Surfaces Using a Two-Step Halogenation/Grignard Route J. Am. Chem. Soc. 1996, 118, 7225-7226
7. Bansal, A.; Lewis, N. S. Stabilization of Si Photoanodes in Aqueous Electrolytes through Surface Alkylation J. Phys. Chem. B 1998, 102, 4058-4060
8. Webb, L. J.; Lewis, N. S. Comparison of the Electrical Properties and Chemical Stability of Crystalline Silicon(111) Surfaces Alkylated Using Grignard Reagents or Olefins with Lewis Acid Catalysts J. Phys. Chem. B 2003, 107, 5404-5412
9. Nemanick, E. J.; Hurley, P. T.; Brunschwig, B. S.; Lewis, N. S. Chemical and Electrical Passivation of Silicon (111) Surfaces through Functionalization with Sterically Hindered Alkyl Groups J. Phys. Chem. B 2006, 110, 14800-14808
10. Cicero, R. L.; Linford, M. R.; Chidsey, C. E. D. Photoreactivity of Unsaturated Compounds with Hydrogen-Terminated Silicon(111) Langmuir 2000, 16, 5688-5695
11. 3 Layers IEEE J. Photovolt. 2013, 3, 678-683
12. 3-Based Surface Passivation Schemes for Silicon Solar Cells J. Vac. Sci. Technol., A 2012, 30, 040802
13. Kalanyan, B.; Parsons, G. Atomic Layer Deposited Oxides for Passivation of Silicon Photoelectrodes for Solar Photoelectrochemical Cells ECS Trans. 2011, 41, 285-292
14. 3 Appl. Phys. Lett. 2010, 96, 112101
15. 3 Electrochem. Solid-State Lett. 2011, 14, H1-H4
16. 3 on H-Terminated Silicon J. Appl. Phys. 2007, 102, 094503
17. 3 Prepared by Remote Plasma Enhanced Chemical Vapor Deposition J. Vac. Sci. Technol., A 2001, 19, 1353-1360
18. 3 Films Grown by Atomic Layer Deposition on Silicon and Various Metal Substrates Thin Solid Films 2002, 413, 186-197
19. Zhao, J.; Wasem, M.; Bradbury, C. R.; Fermín, D. J. Charge Transfer across Self-Assembled Nanoscale Metal-Insulator-Metal Heterostructures J. Phys. Chem. C 2008, 112, 7284-7289
20. Kim, J.; Kim, B.-K.; Cho, S. K.; Bard, A. J. Tunneling Ultramicroelectrode: Nanoelectrodes and Nanoparticle Collisions J. Am. Chem. Soc. 2014, 136, 8173-8176
21. Barfidokht, A.; Ciampi, S.; Luais, E.; Darwish, N.; Gooding, J. J. Distance-Dependent Electron Transfer at Passivated Electrodes Decorated by Gold Nanoparticles Anal. Chem. 2012, 85, 1073-1080
22. Chazalviel, J.-N.; Allongue, P. On the Origin of the Efficient Nanoparticle Mediated Electron Transfer across a Self-Assembled Monolayer J. Am. Chem. Soc. 2010, 133, 762-764
23. 3 Dual Layer Atomic Layer Deposition Coating in High Aspect Ratio Nanopores Nanotechnology 2013, 24, 015602
24. Hämäläinen, J.; Puukilainen, E.; Sajavaara, T.; Ritala, M.; Leskelä, M. Low Temperature Atomic Layer Deposition of Noble Metals Using Ozone and Molecular Hydrogen as Reactants Thin Solid Films 2013, 531, 243-250
25. Brundle, C. R.; Conti, G.; Mack, P. XPS and Angle Resolved XPS, in the Semiconductor Industry: Characterization and Metrology Control of Ultra-Thin Films J. Electron Spectrosc. Relat. Phenom. 2010, 178-179, 433-448
26. 3 Films Grown by Atomic Layer Deposition J. Vac. Sci. Technol., A 2002, 20, 1867-1876
27. 2 Film Thickness Metrology by X-Ray Photoelectron Spectroscopy Appl. Phys. Lett. 1997, 71, 2764-2766
28. Lattimer, J. R. C.; Brunschwig, B. S.; Lewis, N. S.; Gray, H. B. Redox Properties of Mixed Methyl/Vinylferrocenyl Monolayers on Si(111) Surfaces J. Phys. Chem. C 2013, 117, 27012-27022
29. Amatore, C.; Savéant, J. M.; Tessier, D. Charge Transfer at Partially Blocked Surfaces: A Model for the Case of Microscopic Active and Inactive Sites J. Electroanal. Chem. 1983, 147, 39-51
30. Nicholson, R. S.; Shain, I. Theory of Stationary Electrode Polarography. Single Scan and Cyclic Methods Applied to Reversible, Irreversible, and Kinetic Systems Anal. Chem. 1964, 36, 706-723
31. Reinmuth, W. H. Nernst-Controlled Currents in Hanging-Drop Polarography J. Am. Chem. Soc. 1957, 79, 6358-6360
32. Elam, J. W.; Zinovev, A. V. V; Pellin, M. J.; Comstock, D. J.; Hersam, M. C. Nucleation and Growth of Noble Metals on Oxide Surfaces Using Atomic Layer Deposition ECS Trans. 2007, 3, 271-278
33. Puurunen, R. L.; Vandervorst, W.; Besling, W. F. A.; Richard, O.; Bender, H.; Conard, T.; Zhao, C.; Delabie, A.; Caymax, M.; De Gendt, S.; Heyns, M.; Viitanen, M. M.; de Ridder, M.; Brongersma, H. H.; Tamminga, Y.; Dao, T.; de Win, T.; Verheijen, M.; Kaiser, M.; Tuominen, M. Island Growth in the Atomic Layer Deposition of Zirconium Oxide and Aluminum Oxide on Hydrogen-Terminated Silicon: Growth Mode Modeling and Transmission Electron Microscopy J. Appl. Phys. 2004, 96, 4878-4889
34. 2 Nanoislands Nanotechnology 2012, 23, 495603
35. Cai, W.; Lin, Z.; Strother, T.; Smith, L. M.; Hamers, R. J. Chemical Modification and Patterning of Iodine-Terminated Silicon Surfaces Using Visible Light J. Phys. Chem. B 2002, 106, 2656-2664
36. Yu, H.; Webb, L. J.; Ries, R. S.; Solares, S. D.; Goddard, W. A.; Heath, J. R.; Lewis, N. S. Low-Temperature STM Images of Methyl-Terminated Si(111) Surfaces J. Phys. Chem. B 2004, 109, 671-674
37. Some, S.; Ho, S.-M.; Dua, P.; Hwang, E.; Shin, Y. H.; Yoo, H.; Kang, J.-S.; Lee, D.-K.; Lee, H. Dual Functions of Highly Potent Graphene Derivative-Poly- l -Lysine Composites to Inhibit Bacteria and Support Human Cells ACS Nano 2012, 6, 7151-7161
38. Yumitori, S. Correlation of C1s Chemical State Intensities with the O1s Intensity in the XPS Analysis of Anodically Oxidized Glass-Like Carbon Samples J. Mater. Sci. 2000, 35, 139-146
39. Puniredd, S. R.; Assad, O.; Haick, H. Highly Stable Organic Modification of Si(111) Surfaces: Towards Reacting Si with Further Functionalities while Preserving the Desirable Chemical Properties of Full Si-C Atop Site Terminations J. Am. Chem. Soc. 2008, 130, 9184-9185
40. 3 Thin Coatings for Corrosion Protection of Steel: Surface and Electrochemical Analysis Corros. Sci. 2011, 53, 2168-2175
41. Kloprogge, J. T.; Duong, L. V.; Wood, B. J.; Frost, R. L. XPS Study of the Major Minerals in Bauxite: Gibbsite, Bayerite and (Pseudo-)Boehmite J. Colloid Interface Sci. 2006, 296, 572-576
42. Kenneth, D. L.; Arthur, B. E.; Jeffrey, M. B.; Mark, S. W. N-Type Si-Based Photoelectrochemical Cell: New Liquid Junction Photocell Using a Nonaqueous Ferricenium/Ferrocene Electrolyte Proc. Natl. Acad. Sci. U.S.A. 1977, 74, 4116-4120
43. 2 Atomic Layer Deposition by Chronoamperometry and Scanning Electrochemical Microscopy Chem. Mater. 2013, 25, 4165-4172
44. 2 Solar Cells: A Study by Electrical Impedance and Optical Modulation Techniques J. Phys. Chem. B 2000, 104, 2044-2052
45. 4 Surface Modification for Highly Efficient Dye Sensitized Solar Cells Nanoscale 2013, 5, 10438-10446
46. 3 Appl. Phys. Lett. 2010, 96, 032905
47. 3 Films Grown Using Atomic Layer Deposition Surf. Coat. Technol. 2011, 205, 3334-3339
48. Clegg, A. D.; Rees, N. V.; Klymenko, O. V.; Coles, B. A.; Compton, R. G. Marcus Theory of Outer-Sphere Heterogeneous Electron Transfer Reactions: High Precision Steady-State Measurements of the Standard Electrochemical Rate Constant for Ferrocene Derivatives in Alkyl Cyanide Solvents J. Electroanal. Chem. 2005, 580, 78-86
49. Cannes, C.; Kanoufi, F.; Bard, A. J. Cyclic Voltammetry and Scanning Electrochemical Microscopy of Ferrocenemethanol at Monolayer and Bilayer-Modified Gold Electrodes J. Electroanal. Chem. 2003, 547, 83-91
50. Zanello, P. Inorganic Electrochemistry: Theory, Practice and Applications; Royal Society of Chemistry: Cambridge, U.K., 2003; pp 62-63.
51. Geiger, W. E. Chemical Reversibility. In Inorganic Reactions and Methods, Electron-Transfer and Electrochemical Reactions; Photochemical and Other Energized Reactions; Zuckerman, J. J.; Hagen, A. P., Eds.; Wiley: New York, 2009; Vol. 15, p 90.
52. Miao, W.; Ding, Z.; Bard, A. J. Solution Viscosity Effects on the Heterogeneous Electron Transfer Kinetics of Ferrocenemethanol in Dimethyl Sulfoxide-Water Mixtures J. Phys. Chem. B 2002, 106, 1392-1398
53. 2/Si Interface Phys. Rev. B: Condens. Matter Mater. Phys. 1988, 38, 6084-6096
54. Hattori, T. Surface, Interface, and Valence Band Structures of Ultra-Thin Silicon Oxides Appl. Surf. Sci. 1998, 130-132, 156-164
55. 2 Plasma J. Appl. Phys. 2011, 109, 084333
56. Sun, S.; Zhang, G.; Gauquelin, N.; Chen, N.; Zhou, J.; Yang, S.; Chen, W.; Meng, X.; Geng, D.; Banis, M. N.; Li, R.; Ye, S.; Knights, S.; Botton, G. A.; Sham, T.-K.; Sun, X. Single-Atom Catalysis Using Pt/Graphene Achieved through Atomic Layer Deposition Sci. Rep. 2013, 3, 1775
57. 2 Precursors for Nonvolatile Memory Applications Nanoscale Res. Lett. 2013, 8, 80
58. Zhao, J.; Bradbury, C. R.; Fermín, D. J. Long-Range Electronic Communication between Metal Nanoparticles and Electrode Surfaces Separated by Polyelectrolyte Multilayer Films J. Phys. Chem. C 2008, 112, 6832-6841
59. Bradbury, C. R.; Zhao, J.; Fermín, D. J. Distance-Independent Charge-Transfer Resistance at Gold Electrodes Modified by Thiol Monolayers and Metal Nanoparticles J. Phys. Chem. C 2008, 112, 10153-10160