Electrochemical monitoring of TiO2 atomic layer deposition by chronoamperometry and scanning electrochemical microscopy

Chemistry of Materials

Volumn 25, Issue 21, 2013, Pages 4165-4172

  Satpati, Ashis K ^a,c   Arroyo Currás, Netzahualcóyotl ^a   Ji, Li ^a,b   Yu, Edward T ^b   Bard, Allen J ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b The University of Texas at Austin   (United States)

^c BHABHA ATOMIC RESEARCH CENTRE   (India)

Author keywords

atomic layer deposition (ALD); finite element modeling; nanoporous films; scanning electrochemical microscopy (SECM)

Indexed keywords

CONDUCTIVE ATOMIC FORCE MICROSCOPY; CURRENT CONDUCTION; ELECTROCHEMICAL BEHAVIORS; ELECTROCHEMICAL MONITORING; MICROELECTRODE ARRAY; NANO-POROUS FILMS; SCANNING ELECTROCHEMICAL MICROSCOPES; SCANNING ELECTROCHEMICAL MICROSCOPY;

ANALYTIC EQUIPMENT; ATOMIC FORCE MICROSCOPY; CHRONOAMPEROMETRY; DEPOSITION; ELECTRON TRANSITIONS; FINITE ELEMENT METHOD; SCANNING ELECTRON MICROSCOPY; TITANIUM DIOXIDE;

ATOMIC LAYER DEPOSITION;

EID: 84887592508     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm401635v     Document Type: Article

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