Chemical modification and patterning of iodine-terminated silicon surfaces using visible light

Journal of Physical Chemistry B

Volumn 106, Issue 10, 2002, Pages 2656-2664

  Cai, Wei ^a   Lin, Zhang ^a   Strother, Todd ^a   Smith, Lloyd M ^a   Hamers, Robert J ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTOPATTERNING;

CHEMICAL MODIFICATION; IODINE; LIGHT ABSORPTION; LIGHT POLARIZATION; PASSIVATION; PHOTOCHEMICAL REACTIONS; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON;

EID: 0037076133     PISSN: 10895647     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp013523h     Document Type: Article

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