Atomic layer deposited oxides for passivation of silicon photoanodes for solar photoelectrochemical cells

ECS Transactions

Volumn 41, Issue 2, 2011, Pages 285-292

  Kalanyan, B ^a   Parsons, G N ^a  

^a North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ATOMS; CATALYSTS; ELECTROCHEMICAL CELLS; ELECTRODES; II-VI SEMICONDUCTORS; METALS; OXIDE FILMS; OXIDE MINERALS; PASSIVATION; PHOTOELECTROCHEMICAL CELLS; PROTECTIVE COATINGS; SILICA; SILICON; SILICON OXIDES; SUBSTRATES; THIN FILMS; TITANIUM DIOXIDE; ZINC OXIDE;

ATOMIC LAYER DEPOSITED; CRYSTALLINE SILICONS; ELECTRODE OXIDATION; ELLIPSOMETRIC MEASUREMENTS; METAL OXIDE COATINGS; PHOTO-ELECTROCHEMISTRY; WATER OXIDATION CATALYSTS; WATER SPLITTING REACTIONS;

ATOMIC LAYER DEPOSITION;

EID: 84857266659     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3633679     Document Type: Conference Paper

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