Nitrogen-doping of bulk and nanotubular TiO 2 photocatalysts by plasma-assisted atomic layer deposition

Applied Surface Science

Volumn 330, Issue , 2015, Pages 476-486

  Zhang, Yi ^a   Creatore, Mariadriana ^a   Ma, Quan Bao ^a   El Boukili, Aishah ^a   Gao, Lu ^a   Verheijen, Marcel A ^a   Verhoeven, M W G M Tiny ^a   Hensen, Emiel J M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

N doping; Nanotubes; Photocatalysis; Plasma assisted atomic layer deposition; Titania

Indexed keywords

ATOMS; BINDING ENERGY; CALCINATION; INDUCTIVELY COUPLED PLASMA; NANOTUBES; NITROGEN; NITROGEN PLASMA; PHOTOCATALYSIS; PHOTOCURRENTS; PULSED LASER DEPOSITION; SEMICONDUCTOR QUANTUM WELLS; SILICON WAFERS; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY; YARN;

N-DOPING; PHOTOCURRENT DENSITY; PHOTOGENERATED ELECTRONS; PLASMA ASSISTED ATOMIC LAYER DEPOSITIONS; PLASMA EXPOSURE TIME; PRISTINE NANOTUBES; RECOMBINATION CENTERS; TITANIA;

ATOMIC LAYER DEPOSITION;

EID: 84924034955     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2014.12.197     Document Type: Article

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