TiO2 thin films as protective material for transparent-conducting oxides used in Si thin film solar cells

Solar Energy Materials and Solar Cells

Volumn 90, Issue 17, 2006, Pages 2867-2880

  Natsuhara, H ^a   Matsumoto, K ^a   Yoshida, N ^a,c   Itoh, T ^a,c   Nonomura, S ^a,c   Fukawa, M ^b   Sato, K ^b  

^a GIFU UNIVERSITY   (Japan)

^b ASAHI GLASS CO LTD   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Hot wire CVD; Hydrogen radical durability; Silicon thin film solar cells; TiO2

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; REFRACTIVE INDEX; SEMICONDUCTING SILICON; SOLAR CELLS; THIN FILMS;

HOT-WIRE CVD; HYDROGEN RADICAL DURABILITY; SILICON THIN FILM SOLAR CELLS; TIO2;

TITANIUM DIOXIDE;

EID: 33747193618     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2006.05.001     Document Type: Article

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