Enhancement of optical absorption by modulation of the oxygen flow of TiO 2 films deposited by reactive sputtering

Journal of Applied Physics

Volumn 111, Issue 11, 2012, Pages

  Pereira, André L J ^a,b   Lisboa Filho, Paulo N ^a   Acua, Javier ^c   Brandt, Iuri S ^c   Pasa, André A ^c   Zanatta, Antonio R ^d   Vilcarromero, Johnny ^e   Beltrán, Armando ^b   Dias Da Silva, José H ^a  

^a SÃO PAULO STATE UNIVERSITY UNESP   (Brazil)

^b UNIVERSITAT JAUME I   (Spain)

^c FEDERAL UNIVERSITY OF SANTA CATARINA   (Brazil)

^d UNIVERSITY OF SÃO PAULO   (Brazil)

^e FEDERAL UNIVERSITY OF SÃO CARLOS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION COEFFICIENTS; ANATASE PHASE; COLUMNAR MORPHOLOGY; COMPOSITION ANALYSIS; DENSITY FUNCTIONAL THEORY CALCULATIONS; DEPOSITION METHODS; ELECTRONIC STRUCTURE CALCULATIONS; EXPERIMENTAL DATA; FILM COMPOSITION; GAS PRESSURES; GROWING DIRECTION; HIGH DENSITY; MICRO-RAMAN; OPTICAL ABSORPTION COEFFICIENTS; OPTICAL ABSORPTION EDGE; OXYGEN FLOW; OXYGEN-RELATED DEFECTS; PHOTOCATALYTIC ACTIVITIES; PLANAR DIODE; RADIO FREQUENCIES; RED SHIFT; SUBBAND GAP ABSORPTION; TIO; VACANCY STATE; VISIBLE AND NEAR INFRARED;

DENSITY FUNCTIONAL THEORY; DEPOSITION; ELECTRONIC STRUCTURE; FLOW OF GASES; GAS SUPPLY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; INFRARED DEVICES; LIGHT ABSORPTION; OXIDE MINERALS; OXYGEN; OXYGEN VACANCIES; PHOTOCATALYSIS; PLASMA DEPOSITION; SEMICONDUCTOR DOPING; X RAY DIFFRACTION;

TITANIUM DIOXIDE;

EID: 84863299617     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4724334     Document Type: Conference Paper

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