SCOPUS 정보 검색 플랫폼

Electrochemical and Solid-State Letters

Volumn 15, Issue 2, 2012, Pages

Substrate biasing during plasma-assisted ALD for crystalline phase-control of TiO 2 thin films

(3) Profijt, H B a Van De Sanden, M C M a Kessels, W M M a

a EINDHOVEN UNIVERSITY OF TECHNOLOGY (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ANATASE FILMS; CRYSTALLINE PHASE; GROWTH PER CYCLE; ION ENERGIES; MASS DENSITIES; REMOTE PLASMAS; RUTILE TIO; SUBSTRATE BIASING; TIO;

ATOMIC LAYER DEPOSITION; CRYSTALLINE MATERIALS; FILM GROWTH; ION BEAM ASSISTED DEPOSITION; OXIDE MINERALS; PLASMA DEPOSITION; PLASMAS; PULSED LASER DEPOSITION; TITANIUM DIOXIDE; ULTRATHIN FILMS; VAPOR DEPOSITION;

AMORPHOUS FILMS;

EID: 84055212393 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/2.024202esl Document Type: Article

Times cited : (52)

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