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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 31, Issue 1, 2013, Pages

Substrate-biasing during plasma-assisted atomic layer deposition to tailor metal-oxide thin film growth

(3) Profijt, H B a Van De Sanden, M C M a Kessels, W M M a

a EINDHOVEN UNIVERSITY OF TECHNOLOGY (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINITIES; GROWTH PER CYCLE; ION ENERGIES; ION FLUXES; MASS DENSITIES; MATERIAL PROPERTY; METAL OXIDE THIN FILMS; OPTICAL EMISSIONS; REMOTE PLASMAS; SUBSTRATE BIAS VOLTAGES; SUBSTRATE BIASING; TIO;

ALUMINUM COATINGS; ATOMIC LAYER DEPOSITION; BIAS VOLTAGE; PULSED LASER DEPOSITION; THIN FILMS; TITANIUM DIOXIDE;

SUBSTRATES;

EID: 84871862383 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.4756906 Document Type: Article

Times cited : (97)

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