Nitrogen doping in atomic layer deposition grown titanium dioxide films by using ammonium hydroxide

Thin Solid Films

Volumn 526, Issue , 2012, Pages 212-217

  Kaariainen M L ^a   Cameron, D C ^a  

^a LAPPEENRANTA UNIVERSITY OF TECHNOLOGY   (Finland)

Author keywords

Atomic layer deposition; Nitrogen doping; Photoactivity; Photocatalytic activity; Resistivity; Thin films; Titanium dioxide

Indexed keywords

AMMONIUM HYDROXIDE; CARRIER SEPARATION; DOPED FILMS; FILM CONDUCTIVITY; HOT PROBE; INTERSTITIAL NITROGEN; METAL SOURCES; NITROGEN-DOPING; P-N JUNCTION; P-N JUNCTION FORMATION; P-TYPE; PHOTOACTIVITY; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC PERFORMANCE; RECOMBINATION RATE; RED SHIFT; TITANIUM CHLORIDE; TITANIUM DIOXIDE FILMS; UNDOPED FILMS; X RAY PHOTOEMISSION SPECTROSCOPY;

AMMONIUM COMPOUNDS; ATOMIC LAYER DEPOSITION; CHLORINE COMPOUNDS; ELECTRIC CONDUCTIVITY; NITROGEN; OXIDANTS; OXIDE MINERALS; PHOTOCATALYSIS; PHOTOELECTRON SPECTROSCOPY; SEMICONDUCTOR JUNCTIONS; THIN FILMS; TITANIUM; TITANIUM DIOXIDE;

SEMICONDUCTOR DOPING;

EID: 84872160303     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.11.005     Document Type: Article

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