Plasma-enhanced ALD of TiO2 using a novel cyclopentadienyl alkylamido precursor [Ti(CpMe)(NMe2)3] and O2 plasma

ECS Transactions

Volumn 33, Issue 2, 2010, Pages 385-393

  Sarkar, A ^a   Potts, S E ^a   Rushworth, S A ^b   Roozeboom, F ^a   Van De Sanden, M C M ^a   Kessels, W M M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b SAFC Hitech   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ATOMIC LAYER DEPOSITION; ORGANOMETALLICS; OXIDE FILMS; OXIDE MINERALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

CYCLOPENTADIENYLS; DEPOSITED FILMS; ORGANOMETALLIC PRECURSORS; REMOTE PLASMAS; RUTHERFORD BACK-SCATTERING; TITANIUM OXIDE THIN FILMS; WIDE TEMPERATURE RANGES; X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES;

TITANIUM METALLOGRAPHY;

EID: 79952559578     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3485274     Document Type: Conference Paper

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