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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 32, Issue 1, 2014, Pages

Controllable nitrogen doping in as deposited TiO2 film and its effect on post deposition annealing

(10) Deng, Shaoren a Verbruggen, Sammy W b,c Lenaerts, Silvia b Martens, Johan A c Van Den Berghe, Sven d Devloo Casier, Kilian a Devulder, Wouter a Dendooven, Jolien a Deduytsche, Davy a Detavernier, Christophe a

a GHENT UNIVERSITY (Belgium)

b UNIVERSITY OF ANTWERP (Belgium)

c UNIVERSITY OF LEUVEN (Belgium)

d BELGIAN NUCLEAR RESEARCH CENTRE (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION BEHAVIOR; NITROGEN-DOPED TIO; PHOTO-CATALYTIC; PHOTOCATALYTIC ACTIVITIES; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; POST DEPOSITION ANNEALING; PREFERENTIAL GROWTH; SITU X-RAY DIFFRACTION;

ATOMIC LAYER DEPOSITION; CRYSTALLIZATION; DEPOSITION; ENERGY GAP; NITROGEN; OXIDE MINERALS; TITANIUM DIOXIDE; TITANIUM NITRIDE; X RAY DIFFRACTION;

SEMICONDUCTOR DOPING;

EID: 84891789260 PISSN: 07342101 EISSN: 15208559 Source Type: Journal
DOI: 10.1116/1.4847976 Document Type: Article

Times cited : (20)

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