Atomic layer deposition of aluminum oxide in mesoporous silica gel

Journal of Physical Chemistry C

Volumn 114, Issue 41, 2010, Pages 17286-17292

  Elam, Jeffrey W ^a   Libera, Joseph A ^a   Huynh, Trang H ^a   Feng, Hao ^a   Pellin, Michael J ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM OXIDES; HETEROGENEOUS CATALYST; HIGH SPECIFIC SURFACE AREA; HIGH SURFACE AREA; IN-SITU; INITIAL WEIGHTS; MESOPOROUS; MESOPOROUS SILICA GEL; NANO-STRUCTURED CATALYST; NITROGEN ADSORPTION SURFACE; QUADRUPOLE MASS SPECTROMETRY; REACTANT EXPOSURES; SILICA GEL POWDER; SILICA GEL SURFACES; SPHERICAL PARTICLE; SURFACE AREA; TRIMETHYL ALUMINUMS;

ALUMINUM; ALUMINUM COATINGS; ATOMIC LAYER DEPOSITION; CATALYSTS; COATED MATERIALS; GAS ADSORPTION; MASS SPECTROMETRY; METHANE; OXIDES; SCANNING ELECTRON MICROSCOPY; SILICA; SILICA GEL; SURFACES; THERMOANALYSIS;

SURFACE REACTIONS;

EID: 77958021463     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp1030587     Document Type: Article

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