Nanoscale patterning of organosilane molecular thin films from the gas phase and its applications: Fabrication of multifunctional surfaces and large area molecular templates for site-selective material deposition

Langmuir

Volumn 28, Issue 5, 2012, Pages 3045-3052

  George, Antony ^a   Knez, Mato ^b   Hlawacek, Gregor ^c   Hagedoorn, Daniël ^a   Verputten, Hein H J ^a   Van Gastel, Raoul ^c   Ten Elshof, Johan E ^a  

^a Inorganic Materials Science ^*  (Netherlands)

^b MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^c UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL FUNCTIONALITY; COMBINATION PROCESS; FABRICATION PROCESS; GAS-PHASE DEPOSITION; GASPHASE; LATERAL DIMENSION; MATERIAL DEPOSITION; MOLECULAR TEMPLATE; MOLECULAR THIN FILM; MULTI-STEP; NANO-METER-SCALE; NANOSCALE PATTERNING; ORGANOSILANE MOLECULES; ORGANOSILANES; PATTERNED SURFACE; PDMS MOLDS; SHADOW MASK; SITE SELECTIVE;

LITHOGRAPHY; PLASMA ETCHING; SURFACES; THIN FILMS; VAPOR DEPOSITION;

DEPOSITION;

EID: 84856743108     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la204437r     Document Type: Article

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