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Volumn 24, Issue 21, 2012, Pages 4051-4059

Nucleation-controlled growth of nanoparticles by atomic layer deposition

Author keywords

atomic layer deposition; nanoparticle; nucleation; Pt; self assembled monolayer

Indexed keywords

AERIAL DENSITY; BEST FIT; MEAN DIAMETER; METAL ORGANIC; NUCLEATION BEHAVIOR; NUCLEATION CONTROL; NUCLEATION MODELS; NUCLEATION SITES; OCTADECYLTRICHLOROSILANE; PT PRECURSORS; SAMS;

EID: 84869034954     PISSN: 08974756     EISSN: 15205002     Source Type: Journal    
DOI: 10.1021/cm3014978     Document Type: Article
Times cited : (59)

References (63)
  • 32
    • 84869047192 scopus 로고    scopus 로고
    • Nanopatterning by Area-Selective Atomic Layer Deposition
    • In; Wiley-VCH Verlag GmbH & Co. KGaA: Berlin, Germany
    • Lee, H.-B.-R.; Bent, S. F. Nanopatterning by Area-Selective Atomic Layer Deposition. In Atomic Layer Deposition of Nanostructured Materials; Wiley-VCH Verlag GmbH & Co. KGaA: Berlin, Germany, 2011; pp 193-225.
    • (2011) Atomic Layer Deposition of Nanostructured Materials , pp. 193-225
    • Lee, H.-B.-R.1    Bent, S.F.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.