-
1
-
-
33748585230
-
Low-temperature sintered nanoscale silver as a novel semiconductor device-metallized substrate interconnect material
-
Sep.
-
J. G. Bai, Z. Z. Zhang, J. N. Calata, and G. Q. Lu, "Low-temperature sintered nanoscale silver as a novel semiconductor device-metallized substrate interconnect material," IEEE Trans. Compon. Packag. Technol., vol. 29, no. 3, pp. 589-593, Sep. 2006.
-
(2006)
IEEE Trans. Compon. Packag. Technol.
, vol.29
, Issue.3
, pp. 589-593
-
-
Bai, J.G.1
Zhang, Z.Z.2
Calata, J.N.3
Lu, G.Q.4
-
2
-
-
77949570776
-
Low-temperature sintering of nanoscale silver paste for attaching large-area (> 100 m2) chips
-
Mar.
-
T. G. Lei, J. N. Calata, and G. Q. Lu, "Low-temperature sintering of nanoscale silver paste for attaching large-area (> 100 m2) chips," IEEE Trans. Compon. Packag. Technol., vol. 33, no. 1, pp. 98-104, Mar. 2010.
-
(2010)
IEEE Trans. Compon. Packag. Technol.
, vol.33
, Issue.1
, pp. 98-104
-
-
Lei, T.G.1
Calata, J.N.2
Lu, G.Q.3
-
3
-
-
34848862467
-
Low-temperature sintering with nano-silver paste in die-attached interconnection
-
Oct.
-
T. Wang, X. Chen, G. Q. Lu, and G. Y. Lei, "Low-temperature sintering with nano-silver paste in die-attached interconnection," J. Electron. Mater., vol. 36, no. 10, pp. 1333-1340, Oct. 2007.
-
(2007)
J. Electron. Mater.
, vol.36
, Issue.10
, pp. 1333-1340
-
-
Wang, T.1
Chen, X.2
Lu, G.Q.3
Lei, G.Y.4
-
4
-
-
0036826433
-
Pressure-assisted low-temperature sintering of silver paste as an alternative die-attach solution to solder reflow
-
Oct.
-
Z. Zhang and G. Q. Lu, "Pressure-assisted low-temperature sintering of silver paste as an alternative die-attach solution to solder reflow," IEEE Trans. Electron. Packag. Manuf., vol. 25, no. 4, pp. 279-283, Oct. 2002.
-
(2002)
IEEE Trans. Electron. Packag. Manuf.
, vol.25
, Issue.4
, pp. 279-283
-
-
Zhang, Z.1
Lu, G.Q.2
-
5
-
-
79951931386
-
Reliability assessment of sintered nano-silver die attachment for power semiconductors
-
Singapore
-
M. Knoerr, S. Kraft, and A. Schletz, "Reliability assessment of sintered nano-silver die attachment for power semiconductors," in Proc. Electron. Packag. Technol. Conf., Singapore, 2010, pp. 56-61.
-
(2010)
Proc. Electron. Packag. Technol. Conf.
, pp. 56-61
-
-
Knoerr, M.1
Kraft, S.2
Schletz, A.3
-
6
-
-
70349862755
-
Hygrothermal effects on the tensile properties of anisotropic conductive films
-
Nov.
-
Y. H. Mei, X. Chen, and G. Chen, "Hygrothermal effects on the tensile properties of anisotropic conductive films," J. Electron. Mater., vol. 38, no. 11, pp. 2415-2426, Nov. 2009.
-
(2009)
J. Electron. Mater.
, vol.38
, Issue.11
, pp. 2415-2426
-
-
Mei, Y.H.1
Chen, X.2
Chen, G.3
-
7
-
-
84896460895
-
Nanosilver paste: Its sintering behavior and applications for chip interconnection
-
Irvine, CA, USA
-
G. Q. Lu, "Nanosilver paste: Its sintering behavior and applications for chip interconnection," in Proc. APM, Irvine, CA, USA, 2013, p. 298.
-
(2013)
Proc. APM
, pp. 298
-
-
Lu, G.Q.1
-
8
-
-
35348849542
-
Processing and characterization of nanosilver pastes for die-attaching SiC devices
-
Oct.
-
J. G. Bai, J. N. Calata, and G. Q. Lu, "Processing and characterization of nanosilver pastes for die-attaching SiC devices," IEEE Trans. Electron. Packag. Manuf., vol. 30, no. 4, pp. 241-245, Oct. 2007.
-
(2007)
IEEE Trans. Electron. Packag. Manuf.
, vol.30
, Issue.4
, pp. 241-245
-
-
Bai, J.G.1
Calata, J.N.2
Lu, G.Q.3
-
9
-
-
84881106516
-
Low-pressure (< 5 MPa) low-temperaturejoining of large-area chips on copper using nanosilver paste
-
Nuremberg, Germany
-
H. G. Zheng, J. Calata, N. Khai, S. Luo, and G. Q. Lu, "Low-pressure (< 5 MPa) low-temperaturejoining of large-area chips on copper using nanosilver paste," in Proc. CIPS, Nuremberg, Germany, 2012, pp. 1-6.
-
(2012)
Proc. CIPS
, pp. 1-6
-
-
Zheng, H.G.1
Calata, J.2
Khai, N.3
Luo, S.4
Lu, G.Q.5
-
10
-
-
84869383200
-
Pressure-assisted low-temperature sintering of nanosilver paste for 5 × 5 mm2 chip attachment
-
Nov.
-
G. Chen, Y. J. Cao, and Y. H. Mei, "Pressure-assisted low-temperature sintering of nanosilver paste for 5 × 5 mm2 chip attachment," IEEE Trans. Electron. Packag. Manuf., vol. 2, no. 11, pp. 1759-1767, Nov. 2012.
-
(2012)
IEEE Trans. Electron. Packag. Manuf.
, vol.2
, Issue.11
, pp. 1759-1767
-
-
Chen, G.1
Cao, Y.J.2
Mei, Y.H.3
-
11
-
-
77955212388
-
Effect of die-attach material on performance and reliability of high-power light-emitting diode modules
-
Las Vegas, NV, USA
-
X. Li, X. Chen, and G. Q. Lu, "Effect of die-attach material on performance and reliability of high-power light-emitting diode modules," in Proc. ECTC, Las Vegas, NV, USA, 2010, pp. 1344-1346.
-
(2010)
Proc. ECTC
, pp. 1344-1346
-
-
Li, X.1
Chen, X.2
Lu, G.Q.3
-
12
-
-
84863285972
-
Transient thermal performance of IGBT power modules attached by low-temperature dintered nanosilver
-
Mar.
-
G. Chen, D. Han, and Y. H. Mei, "Transient thermal performance of IGBT power modules attached by low-temperature dintered nanosilver," IEEE Trans. Device Mater. Rel., vol. 12, no. 1, pp. 124-132, Mar. 2012.
-
(2012)
IEEE Trans. Device Mater. Rel.
, vol.12
, Issue.1
, pp. 124-132
-
-
Chen, G.1
Han, D.2
Mei, Y.H.3
-
13
-
-
84862812391
-
Effect of joint sizes of low-temperature sintered nano-silver on thermal residual curvature of sandwiched assembly
-
Jun.
-
Y. H. Mei, G. Chen, and G. Q. Lu, "Effect of joint sizes of low-temperature sintered nano-silver on thermal residual curvature of sandwiched assembly," Int. J. Adhesion Adhesive, vol. 35, pp. 88-93, Jun. 2012.
-
(2012)
Int. J. Adhesion Adhesive
, vol.35
, pp. 88-93
-
-
Mei, Y.H.1
Chen, G.2
Lu, G.Q.3
-
14
-
-
33747937813
-
Silver metallization for advanced interconnects
-
Feb.
-
R. Manepalli, F. Stepniak, S. A. Bidstrup-Allen, and P. A. Kohl, "Silver metallization for advanced interconnects," IEEE Trans. Adv. Packag., vol. 22, no. 1, pp. 4-8, Feb. 1999.
-
(1999)
IEEE Trans. Adv. Packag.
, vol.22
, Issue.1
, pp. 4-8
-
-
Manepalli, R.1
Stepniak, F.2
Bidstrup-Allen, S.A.3
Kohl, P.A.4
-
15
-
-
0023166987
-
A review of corrosion failure mechanisms during accelerated tests
-
Jan.
-
J. J. Steppan, J. A. Roth, L. C. Hall, D. A. Jeannotte, and S. P. Carbone, "A review of corrosion failure mechanisms during accelerated tests," J. Electrochem. Soc., vol. 134, no. 1, pp. 175-190, Jan. 1987.
-
(1987)
J. Electrochem. Soc.
, vol.134
, Issue.1
, pp. 175-190
-
-
Steppan, J.J.1
Roth, J.A.2
Hall, L.C.3
Jeannotte, D.A.4
Carbone, S.P.5
-
16
-
-
84856731105
-
Electrochemical migration behaviour of Cu, Sn, Ag and Sn63/Pb37
-
Feb.
-
B. Medgyes, B. Illés, and G. Harsányi, " Electrochemical migration behaviour of Cu, Sn, Ag and Sn63/Pb37," J. Mater. Sci, Mater. Electron., vol. 23, no. 2, pp. 551-556, Feb. 2012.
-
(2012)
J. Mater. Sci, Mater. Electron.
, vol.23
, Issue.2
, pp. 551-556
-
-
Medgyes, B.1
Illés, B.2
Harsányi, G.3
-
17
-
-
0029375841
-
Electrochemical processes resulting in migrated short failures in microcircuits
-
Sep.
-
G. Harsanyi, "Electrochemical processes resulting in migrated short failures in microcircuits," IEEE Trans. Compon., Packag., Manuf. Technol. A, vol. 18, no. 3, pp. 602-610, Sep. 1995.
-
(1995)
IEEE Trans. Compon., Packag., Manuf. Technol. A
, vol.18
, Issue.3
, pp. 602-610
-
-
Harsanyi, G.1
-
18
-
-
36348964807
-
Low-temperature and pressureless sintering technology for high-performance and hightemperature interconnection of semiconductor devices
-
London, U. K.
-
G. Q. Lu, J. N. Calata, G. Y. Lei, and X. Chen, "Low-temperature and pressureless sintering technology for high-performance and hightemperature interconnection of semiconductor devices," in Proc. Int. Conf. Thermal Mech. Multi-Phys. Simul. Exp. Microelectron. Micro-Syst., London, U. K., 2007, pp. 1-5.
-
(2007)
Proc. Int. Conf. Thermal Mech. Multi-Phys. Simul. Exp. Microelectron. Micro-Syst.
, pp. 1-5
-
-
Lu, G.Q.1
Calata, J.N.2
Lei, G.Y.3
Chen, X.4
-
19
-
-
0030106143
-
On the resistance of silver migration in Ag-Pd conductive thick films under humid environment and applied DC field
-
Mar.
-
J. C. Lin and J. Y. Chan, "On the resistance of silver migration in Ag-Pd conductive thick films under humid environment and applied DC field," Mater. Chem. Phys., vol. 43, no. 3, pp. 256-265, Mar. 1996.
-
(1996)
Mater. Chem. Phys.
, vol.43
, Issue.3
, pp. 256-265
-
-
Lin, J.C.1
Chan, J.Y.2
-
20
-
-
0016552288
-
Silver migration in glass dams between silver-palladium interconnections
-
Sep.
-
G. J. Kahan, "Silver migration in glass dams between silver-palladium interconnections," IEEE Trans. Elect. Insul., vol. EI-10, no. 3, pp. 86-94, Sep. 1975.
-
(1975)
IEEE Trans. Elect. Insul.
, vol.EI-10
, Issue.3
, pp. 86-94
-
-
Kahan, G.J.1
-
21
-
-
0024627740
-
Correlation of silver migration with Temperature-Humidity-Bias (THB) failures in multilayer ceramic capacitors
-
Mar.
-
H. C. Lin and A. M. Jackson, "Correlation of silver migration with Temperature-Humidity-Bias (THB) failures in multilayer ceramic capacitors," IEEE Trans. Compon. Hybrids Manuf. Technol., vol. 12, no. 1, pp. 130-137, Mar. 1989.
-
(1989)
IEEE Trans. Compon. Hybrids Manuf. Technol.
, vol.12
, Issue.1
, pp. 130-137
-
-
Lin, H.C.1
Jackson, A.M.2
-
22
-
-
0033170207
-
Moisture degradation mechanism of silverbased low-emissivity coatings
-
Aug.
-
E. Ando and M. Miyazaki, "Moisture degradation mechanism of silverbased low-emissivity coatings," Thin Solid Films, vol. 351, no. 1/2, pp. 308-312, Aug. 1999.
-
(1999)
Thin Solid Films
, vol.351
, Issue.1-2
, pp. 308-312
-
-
Ando, E.1
Miyazaki, M.2
-
23
-
-
79952902564
-
Electrochemical migration of tin in electronics and microstructure of the dendrites
-
May.
-
D. Minzari, F. B. Grumsen, M. S. Jellesen, P. Moller, and R. Ambat, "Electrochemical migration of tin in electronics and microstructure of the dendrites," Corros. Sci., vol. 53, no. 5, pp. 1659-1669, May. 2011.
-
(2011)
Corros. Sci.
, vol.53
, Issue.5
, pp. 1659-1669
-
-
Minzari, D.1
Grumsen, F.B.2
Jellesen, M.S.3
Moller, P.4
Ambat, R.5
-
24
-
-
67650418223
-
Evaluation of electrochemical migration on flexible printed circuit boards with different surface finishes
-
Jun.
-
B. I. Noh, J. W. Yoon, W. S. Hong, and S. B. Jung, "Evaluation of electrochemical migration on flexible printed circuit boards with different surface finishes," J. Electron. Mater., vol. 38, no. 6, pp. 902-907, Jun. 2009.
-
(2009)
J. Electron. Mater.
, vol.38
, Issue.6
, pp. 902-907
-
-
Noh, B.I.1
Yoon, J.W.2
Hong, W.S.3
Jung, S.B.4
-
25
-
-
33747800312
-
Initial stage of silver electrochemical migration degradation
-
Sep.-Nov.
-
S. Yang, J. Wu, and A. Christou, "Initial stage of silver electrochemical migration degradation," Microelectron. Reliab., vol. 46, no. 9-11, pp. 1915-1921, Sep.-Nov. 2006.
-
(2006)
Microelectron. Reliab.
, vol.46
, pp. 1915-1921
-
-
Yang, S.1
Wu, J.2
Christou, A.3
-
26
-
-
0020297175
-
Metal migration (Ag, Cu, Pb) in encapsulated modules and time-to-fail model as a function of the environment and package properties
-
San Diego, NV, USA
-
G. DiGiacomo, "Metal migration (Ag, Cu, Pb) in encapsulated modules and time-to-fail model as a function of the environment and package properties," in Proc. Reliab. Phys. Symp., San Diego, NV, USA, 1982, pp. 27-33.
-
(1982)
Proc. Reliab. Phys. Symp.
, pp. 27-33
-
-
Digiacomo, G.1
-
27
-
-
51249178640
-
The role of electrochemical migration and moisture adsorption on the reliability of metallized ceramic substrates
-
Mar.
-
G. W. Warren, P. Wynblatt, and M. Zamanzadeh, "The role of electrochemical migration and moisture adsorption on the reliability of metallized ceramic substrates," J. Electron. Mater., vol. 18, no. 2, pp. 339-353, Mar. 1989.
-
(1989)
J. Electron. Mater.
, vol.18
, Issue.2
, pp. 339-353
-
-
Warren, G.W.1
Wynblatt, P.2
Zamanzadeh, M.3
-
28
-
-
0034825829
-
A dry migration? Copper dendrite growth in adhesive tape during burn-in
-
Singapore
-
S. H. Tan and S. H. Ong, "A dry migration? Copper dendrite growth in adhesive tape during burn-in," in Proc. Int. Symp. Phys. Failure Anal. Integr. Circuits, Singapore, 2001, pp. 178-182.
-
(2001)
Proc. Int. Symp. Phys. Failure Anal. Integr. Circuits
, pp. 178-182
-
-
Tan, S.H.1
Ong, S.H.2
-
29
-
-
80052968671
-
Investigation of post-etch copper residue on direct bonded copper (DBC) substrates
-
Oct.
-
Y. H. Mei, G. Q. Lu, X. Chen, C. Gang, S. F. Luo, and D. Ibitayo, "Investigation of post-etch copper residue on direct bonded copper (DBC) substrates," J. Electron. Mater., vol. 40, no. 10, pp. 2119-2125, Oct. 2011.
-
(2011)
J. Electron. Mater.
, vol.40
, Issue.10
, pp. 2119-2125
-
-
Mei, Y.H.1
Lu, G.Q.2
Chen, X.3
Gang, C.4
Luo, S.F.5
Ibitayo, D.6
-
30
-
-
0019581158
-
Migration of silver from silver-loaded polyimide adhesive chip bonds at high temperatures
-
Jun.
-
R. Chaffin, "Migration of silver from silver-loaded polyimide adhesive chip bonds at high temperatures," IEEE Trans. Compon. Hybrids Manuf. Technol., vol. CHMT-4, no. 2, pp. 214-216, Jun. 1981.
-
(1981)
IEEE Trans. Compon. Hybrids Manuf. Technol.
, Issue.2
, pp. 214-216
-
-
Chaffin, R.1
-
31
-
-
81355135690
-
Migration of sintered nanosilver die-attach material on alumina substrate at high temperatures
-
Shanghai, China
-
Y. H. Mei, D. Ibitayo, X. Chen, S. Luo, and G. Q. Lu, "Migration of sintered nanosilver die-attach material on alumina substrate at high temperatures," in Proc. ICEPT-HDP, Shanghai, China, 2011, pp. 1-6.
-
(2011)
Proc. ICEPT-HDP
, pp. 1-6
-
-
Mei, Y.H.1
Ibitayo, D.2
Chen, X.3
Luo, S.4
Lu, G.Q.5
-
32
-
-
79959524708
-
Migration of sintered nanosilver die-attach material on alumina substrate between 250 C and 400 C in dry air
-
Jun.
-
Y. H. Mei, G. Q. Lu, and X. Chen, "Migration of sintered nanosilver die-attach material on alumina substrate between 250 C and 400 C in dry air," IEEE Trans. Device Mater. Rel., vol. 11, no. 2, pp. 316-322, Jun. 2011.
-
(2011)
IEEE Trans. Device Mater. Rel.
, vol.11
, Issue.2
, pp. 316-322
-
-
Mei, Y.H.1
Lu, G.Q.2
Chen, X.3
-
33
-
-
0020295535
-
Silver migration model for Ag-Au-Pd conductors
-
Dec.
-
J. Gagne, "Silver migration model for Ag-Au-Pd conductors," IEEE Trans. Compon. Hybrids Manuf. Technol., vol. CHMT-5, no. 4, pp. 402-407, Dec. 1982.
-
(1982)
IEEE Trans. Compon. Hybrids Manuf. Technol.
, vol.CHMT-5
, Issue.4
, pp. 402-407
-
-
Gagne, J.1
-
34
-
-
0031145567
-
Resistance to silver electrolytic migration for thick-film conductors prepared from mixed and alloyed powders of Ag-15Pd and Ag-30Pd
-
Jan.
-
J. C. Lin and J. Y. Chuang, "Resistance to silver electrolytic migration for thick-film conductors prepared from mixed and alloyed powders of Ag-15Pd and Ag-30Pd," J. Electrochem. Soc., vol. 144, no. 5, pp. 1652-1659, Jan. 1997.
-
(1997)
J. Electrochem. Soc.
, vol.144
, Issue.5
, pp. 1652-1659
-
-
Lin, J.C.1
Chuang, J.Y.2
-
35
-
-
78650736677
-
Microstructure, electrical properties, and electrochemical migration of a directly printed Ag pattern
-
Jan.
-
B. I. Non, J. W. Yoon, K. S. Kim, Y. C. Lee, and S. B. Jung, "Microstructure, electrical properties, and electrochemical migration of a directly printed Ag pattern," J. Electron. Mater., vol. 40, no. 1, pp. 35-41, Jan. 2011.
-
(2011)
J. Electron. Mater.
, vol.40
, Issue.1
, pp. 35-41
-
-
Non, B.I.1
Yoon, J.W.2
Kim, K.S.3
Lee, Y.C.4
Jung, S.B.5
-
36
-
-
84896471839
-
Mechanism of migration of sintered nanosilver at high temperatures in dry air for electronic packaging
-
DOI:10. 1109/TDMR. 2013. 2282041
-
G-Q. Lu, W. Yang, Y.-. H. Mei, X. Li, G. Chen, and X. Chen, "Mechanism of migration of sintered nanosilver at high temperatures in dry air for electronic packaging," IEEE Trans. Devices Mater. Rel., DOI:10. 1109/TDMR. 2013. 2282041.
-
IEEE Trans. Devices Mater. Rel.
-
-
Lu, G.-Q.1
Yang, W.2
Mei, Y.H.3
Li, X.4
Chen, G.5
Chen, X.6
-
37
-
-
84902184838
-
The structure of crystalline solids
-
D. William and J. Callister, "The structure of crystalline solids," in Materials Science and Engineering., 7th ed. Hoboken, NJ, USA: Wiley, 1989, ch. 3, sec. 14, pp. 64-65.
-
Materials Science and Engineering., 7th Ed. Hoboken, NJ, USA: Wiley, 1989, Ch. 3, Sec. 14
, pp. 64-65
-
-
William, D.1
Callister, J.2
-
39
-
-
0038778440
-
Reliability evaluation and failure analysis for NTC thermistor
-
Apr.
-
J. S. Jung, J. W. Kim, M. S. Kim, J. S. Jang, and D. S. Ryu, "Reliability evaluation and failure analysis for NTC thermistor," J. Mod. Phys. B, vol. 17, no. 8/9, pp. 1254-1260, Apr. 2003.
-
(2003)
J. Mod. Phys. B
, vol.17
, Issue.8-9
, pp. 1254-1260
-
-
Jung, J.S.1
Kim, J.W.2
Kim, M.S.3
Jang, J.S.4
Ryu, D.S.5
|