Impact of rapid thermal annealing on structural, optical and electrical properties of DC sputtered doped and co-doped ZnO thin film

Applied Surface Science

Volumn 288, Issue , 2014, Pages 411-415

  Gupta, Chandan Ashis ^a   Mangal, Sutanu ^a   Singh, Udai P ^a  

^a KIIT UNIVERSITY   (India)

Author keywords

DC sputtering; Doped and co doped ZnO thin films; Thermal annealing

Indexed keywords

ALUMINUM; CARRIER CONCENTRATION; CRYSTALLITE SIZE; II-VI SEMICONDUCTORS; METALLIC FILMS; OPTICAL FILMS; RAPID THERMAL ANNEALING; SCANNING ELECTRON MICROSCOPY; SURFACE MORPHOLOGY; X RAY DIFFRACTION; ZINC OXIDE;

CO-DOPED ZNO; DC MAGNETRON SPUTTERING; DC SPUTTERING; DIFFERENT STRUCTURE; GROWTH ORIENTATIONS; OPTICAL AND ELECTRICAL PROPERTIES; THERMAL-ANNEALING; ZINC OXIDE THIN FILMS;

THIN FILMS;

EID: 84888435832     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.10.048     Document Type: Article

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