Optical properties of Al-doped ZnO thin films deposited by two different sputtering methods

Crystal Research and Technology

Volumn 41, Issue 12, 2006, Pages 1198-1202

  Keunbin, Yim ^a   Chongmu, Lee ^a  

^a Inha University   (South Korea)

Author keywords

Al doped ZnO (AZO); R.F. magnetron sputtering; R.F. power; Transmittance; Transparent conducting oxide (TCO)

Indexed keywords

ALUMINUM; ATOMIC FORCE MICROSCOPY; DOPING (ADDITIVES); MAGNETRON SPUTTERING; OPACITY; PHOTOLUMINESCENCE; X RAY DIFFRACTION; ZINC OXIDE;

CRYSTALLINITY; DEEP LEVEL EMISSION; POWER RATIO; TRANSPARENT CONDUCTING OXIDE (TCO);

THIN FILMS;

EID: 33845591634     PISSN: 02321300     EISSN: 15214079     Source Type: Journal    
DOI: 10.1002/crat.200610749     Document Type: Article

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