High rate direct current magnetron sputtered and texture-etched zinc oxide films for silicon thin film solar cells

Thin Solid Films

Volumn 516, Issue 14, 2008, Pages 4628-4632

  Tohsophon, T ^a,b   Hupkes J ^a   Siekmann, H ^a   Rech, B ^a   Schultheis, M ^c   Sirikulrat, N ^d  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b SRINAKHARINWIROT UNIVERSITY   (Thailand)

^c WC Heraeus GmbH   (Germany)

^d CHIANG MAI UNIVERSITY   (Thailand)

Author keywords

Aluminum doped zinc oxide; Ceramic target; Solar cells; Sputtering

Indexed keywords

MAGNETRON SPUTTERING; SILICON COMPOUNDS; SOLAR CELLS; ZINC OXIDE;

ALUMINUM-DOPED ZINC OXIDE; CERAMIC TARGETS; SILICON THIN FILM SOLAR CELLS;

THIN FILMS;

EID: 42649137956     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.061     Document Type: Article

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