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Journal of Crystal Growth

Volumn 281, Issue 2-4, 2005, Pages 475-480

Post-annealing of Al-doped ZnO films in hydrogen atmosphere

(5) Oh, Byeong Yun a Jeong, Min Chang a Kim, Doo Soo a Lee, Woong a Myoung, Jae Min a

a Yonsei University (South Korea)

Author keywords

A1. Hydrogen passivation; B1. Al doped ZnO (ZnO:Al); B1. Transparent conductive oxide (TCO)

Indexed keywords

ALUMINUM; ANNEALING; CRYSTALLINE MATERIALS; ELECTRIC PROPERTIES; GLASS; HYDROGEN; OXIDES; PASSIVATION; SEMICONDUCTOR DOPING; SUBSTRATES; THIN FILMS;

AL-DOPED ZNO (ZNO:AL); BURSTEIN-MOSS EFFECTS; HYDROGEN PASSIVATION; TRANSPORT CONDUCTIVE OXIDE (TCO);

ZINC OXIDE;

EID: 22144438031 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/j.jcrysgro.2005.04.045 Document Type: Article

Times cited : (192)

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