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Physica E: Low-Dimensional Systems and Nanostructures

Volumn 43, Issue 1, 2010, Pages 228-234

Effect of substrate temperature on the structural, electrical and optical properties of ZnO:Ga thin films prepared by RF magnetron sputtering

(6) Wu, F a Fang, L a Pan, Y J a Zhou, K a Huang, Q L a Kong, C Y b

a CHONGQING UNIVERSITY (China)

b CHONGQING NORMAL UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC COMPOSITIONS; CHEMICAL ELEMENT COMPOSITION; CHEMICAL STATE; DOUBLE-BEAM; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL PROPERTY; FIGURE OF MERIT; FILM CRYSTALLINITY; GALLIUM DOPED ZINC OXIDES; GLASS SUBSTRATES; HALL MEASUREMENTS; RF-MAGNETRON SPUTTERING; SEM; SUBSTRATE TEMPERATURE; XPS; XRD; ZNO:GA THIN FILMS;

CHEMICAL ELEMENTS; ELECTRIC PROPERTIES; GALLIUM; GALLIUM ALLOYS; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; OXIDE FILMS; OXYGEN; OXYGEN VACANCIES; SUBSTRATES; SURFACE STRUCTURE; THIN FILMS; ZINC OXIDE;

FILM PREPARATION;

EID: 78649948266 PISSN: 13869477 EISSN: None Source Type: Journal
DOI: 10.1016/j.physe.2010.07.007 Document Type: Article

Times cited : (41)

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