Effects of post-annealing on the structural and nanomechanical properties of Ga-doped ZnO thin films deposited on glass substrate by rf-magnetron sputtering

Applied Surface Science

Volumn 258, Issue 3, 2011, Pages 1261-1266

  Wang, Szu Ko ^a   Lin, Ting Chun ^a   Jian, Sheng Rui ^a   Juang, Jenh Yih ^b   Jang, Jason S C ^c   Tseng, Jiun Yi ^d  

^a I SHOU UNIVERSITY   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^c NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^d INSTITUTE OF PHYSICS   (Taiwan)

Author keywords

AFM; Hardness; Nanoindentation; XRD; ZnO:Ga thin films

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; ELASTIC MODULI; GALLIUM COMPOUNDS; GLASS; HARDNESS; II-VI SEMICONDUCTORS; MAGNETRON SPUTTERING; METALLIC FILMS; NANOINDENTATION; OPTICAL FILMS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE ROUGHNESS; X RAY DIFFRACTION; ZINC OXIDE;

ANNEALING TEMPERATURES; AVERAGE GRAIN SIZE; CONTACT STIFFNESS; LOW DEPOSITION TEMPERATURE; NANOINDENTATION TECHNIQUES; NANOMECHANICAL PROPERTY; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING;

THIN FILMS;

EID: 80455122744     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.09.088     Document Type: Article

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