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Applied Physics Letters

Volumn 103, Issue 8, 2013, Pages

Epitaxial growth of AlN films via plasma-assisted atomic layer epitaxy

(6) Nepal, N a Qadri, S B a Hite, J K a Mahadik, N A a Mastro, M A a Eddy Jr , C R a

a NAVAL RESEARCH LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONFORMAL GROWTH; FULL WIDTH AT THE HALF MAXIMUMS; GROWTH CONDITIONS; ISLAND SIZE DISTRIBUTION; LOW TEMPERATURES; ROCKING CURVES; TRIMETHYALUMINUM; X-RAY DIFFRACTION MEASUREMENTS;

CURVE FITTING; SAPPHIRE; SILICON; SPECTROSCOPIC ELLIPSOMETRY; X RAY DIFFRACTION;

EPITAXIAL GROWTH;

EID: 84883356659 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.4818792 Document Type: Article

Times cited : (53)

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