Thermal stability and desorption of group III nitrides prepared by metal organic chemical vapor deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3532-3542

  Ambacher, O ^a   Brandt, M S ^a   Dimitrov, R ^a   Metzger, T ^a   Stutzmann, M ^a   Fischer, R A ^b   Miehr, A ^b   Bergmaier, A ^c   Dollinger, G ^c  

^a WALTER SCHOTTKY INSTITUT   (Germany)

^b UNIVERSITY OF HEIDELBERG   (Germany)

^c TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5344240387     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588793     Document Type: Article

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