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Materials Science in Semiconductor Processing

Volumn 16, Issue 6, 2013, Pages 2005-2012

Influence of Ti film thickness and oxidation temperature on TiO2 thin film formation via thermal oxidation of sputtered Ti film

(3) Sartale, S D a Ansari, A A a Rezvani, S J a

a UNIVERSITY OF PUNE (India)

Author keywords

Raman spectroscopy; Rutile; Thermal oxidation; TiO2; XRD

Indexed keywords

ENERGY DISPERSIVE X-RAY; INTERMEDIATE PHASIS; OXIDATION TEMPERATURE; RUTILE; THERMAL OXIDATION; TIO; UV-VIS-NIR SPECTROSCOPY; XRD;

CRYSTAL STRUCTURE; FILM THICKNESS; QUARTZ; RAMAN SPECTROSCOPY; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; X RAY DIFFRACTION;

OXIDATION;

EID: 84882759933 PISSN: 13698001 EISSN: None Source Type: Journal
DOI: 10.1016/j.mssp.2013.07.006 Document Type: Article

Times cited : (24)

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