Electron-beam-induced topographical, chemical, and structural patterning of amorphous titanium oxide films

Journal of Physical Chemistry B

Volumn 110, Issue 47, 2006, Pages 23660-23668

  Kern, P ^a   Muller Y ^a   Patscheider, J ^a   Michler, J ^a  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

BIOCOMPATIBILITY; CRYSTALLIZATION; ELECTROLYSIS; ELECTRON BEAMS; REDUCTION; SENSITIVITY ANALYSIS; TITANIUM OXIDES;

AMORPHOUS TITANIUM OXIDE FILMS; ANNEALING TEMPERATURE; ELECTRON BEAM IRRADIATION; OXIDE REDUCTION;

AMORPHOUS FILMS;

EID: 33846167442     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp0642589     Document Type: Article

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