Surface structure and composition of flat titanium thin films as a function of film thickness and evaporation rate

Applied Surface Science

Volumn 250, Issue 1-4, 2005, Pages 252-267

  Cai, Kaiyong ^a   Müller, Michael ^a   Bossert, Jörg ^a   Rechtenbach, Annett ^b   Jandt, Klaus D ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^b UNIVERSITY OF APPLIED SCIENCES JENA   (Germany)

Author keywords

AFM; Contact angle; Nanostructure; Surface characterization; Titanium thin film; XPS; XRD

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPOSITION; CONTACT ANGLE; CRYSTAL STRUCTURE; DEPOSITION; EVAPORATION; NANOSTRUCTURED MATERIALS; SURFACE TOPOGRAPHY; TITANIUM; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

EVAPORATION RATE; FILE THICKNESS; SURFACE CHARACTERIZATION; WETTABILITY;

THIN FILMS;

EID: 23844517454     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.01.013     Document Type: Article

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