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Chemical Physics Letters

Volumn 395, Issue 4-6, 2004, Pages 259-263

The structure and thermal stability of TiO 2 grown by the plasma oxidation of sputtered metallic Ti thin films

(5) He, Gang a Fang, Qi a Zhu, Liqiang a Liu, Mao a Zhang, Lide a

a INSTITUTE OF SOLID STATE PHYSICS (China)

Author keywords

[No Author keywords available]

Indexed keywords

OXYGEN; SILICON; SILICON DIOXIDE; TITANIUM; TITANIUM DIOXIDE;

ARTICLE; CHEMICAL STRUCTURE; CORRELATION ANALYSIS; DIELECTRIC CONSTANT; FILM; GROWTH; INFRARED SPECTROSCOPY; OBSERVATION; OXIDATION; PLASMA; RAMAN SPECTROMETRY; TEMPERATURE; THERMOSTABILITY; X RAY DIFFRACTION;

EID: 4444361316 PISSN: 00092614 EISSN: None Source Type: Journal
DOI: 10.1016/j.cplett.2004.07.090 Document Type: Article

Times cited : (32)

References (17)

1
- 0000697110
- B. Brar, G.D. Wilk, and A.C. Seabaugh Appl. Phys. Lett. 69 1996 2728
- (1996) Appl. Phys. Lett. , vol.69 , pp. 2728
- Brar, B.¹ Wilk, G.D.² Seabaugh, A.C.³

2
- 0035101132
- M.H. Cho, D.H. Ko, Y.G. Choi, K. Jeong, D.Y. Noh, H.J. Kim, and C.N. Whang J. Vac. Sci. Technol. A. 19 2001 192
- (2001) J. Vac. Sci. Technol. A. , vol.19 , pp. 192
- Cho, M.H.¹ Ko, D.H.² Choi, Y.G.³ Jeong, K.⁴ Noh, D.Y.⁵ Kim, H.J.⁶ Whang, C.N.⁷

3
- 0032516989
- G.B. Alers, D.J. Werder, Y. Chabal, H.C. Lu, E.P. Gusev, E. Garfunkel, T. Gustafsson, and R.S. Urgahl Appl. Phys. Lett. 73 1998 1517
- (1998) Appl. Phys. Lett. , vol.73 , pp. 1517
- Alers, G.B.¹ Werder, D.J.² Chabal, Y.³ Lu, H.C.⁴ Gusev, E.P.⁵ Garfunkel, E.⁶ Gustafsson, T.⁷ Urgahl, R.S.⁸

4
- 0035831847
- I. Pallecchi, G. Grassano, D. Marre, L. Pellegrino, M. Putti, and A.S. Siri Appl. Phys. Lett. 78 2001 2244
- (2001) Appl. Phys. Lett. , vol.78 , pp. 2244
- Pallecchi, I.¹ Grassano, G.² Marre, D.³ Pellegrino, L.⁴ Putti, M.⁵ Siri, A.S.⁶

5
- 0037416533
- Q. Fang, J.-Y. Zhang, Z.M. Wang, J.X. Wu, B.J. O'Sullivan, and Iam W. Boyd Thin Solid Film 427 2003 391
- (2003) Thin Solid Film , vol.427 , pp. 391
- Fang, Q.¹ Zhang, J.-Y.² Wang, Z.M.³ Wu, J.X.⁴ O'Sullivan, B.J.⁵ Boyd, I.W.⁶

6
- 0000003834
- H.-K. Ha, M. Yoshimoto, H. Koinuma, B.-K. Moon, and H. Ishiwara Appl. Phys. Lett. 68 1996 2965
- (1996) Appl. Phys. Lett. , vol.68 , pp. 2965
- Ha, H.-K.¹ Yoshimoto, M.² Koinuma, H.³ Moon, B.-K.⁴ Ishiwara, H.⁵

7
- 0030291621
- K.J. Hubbard, and D.G. Schlom J. Mater. Res. 11 1996 2757
- (1996) J. Mater. Res. , vol.11 , pp. 2757
- Hubbard, K.J.¹ Schlom, D.G.²

8
- 0032255101
- San Francisco, USA, December 6-9
- Y. Jeon, B.H. Lee, K. Zawadzki, W.-J. Qi, A. Lucas, R. Nieh, J.C. Lee, in: IEEE International Electron Devices Meeting Technical Digest, San Francisco, USA, December 6-9, 1998, p. 797
- (1998) IEEE International Electron Devices Meeting Technical Digest , pp. 797
- Jeon, Y.¹ Lee, B.H.² Zawadzki, K.³ Qi, W.-J.⁴ Lucas, A.⁵ Nieh, R.⁶ Lee, J.C.⁷

9
- 0025522824
- W.W. Xu, R. Kershaw, K. Dwigh, and A. Wold Mater. Res. Bull. 25 1990 1385
- (1990) Mater. Res. Bull. , vol.25 , pp. 1385
- Xu, W.W.¹ Kershaw, R.² Dwigh, K.³ Wold, A.⁴

10
- 0034513072
- J. Aarik, A. Aidla, H. Mandar, and V. Sammelselg J. Cryst. Growth 220 2000 531
- (2000) J. Cryst. Growth , vol.220 , pp. 531
- Aarik, J.¹ Aidla, A.² Mandar, H.³ Sammelselg, V.⁴

11
- 0034300887
- K. Kukli, A. Aidla, J. Aarik, M. Schuisky, A. Harsta, M. Ritala, and M. Leskela Langmuir 16 2000 8122
- (2000) Langmuir , vol.16 , pp. 8122
- Kukli, K.¹ Aidla, A.² Aarik, J.³ Schuisky, M.⁴ Harsta, A.⁵ Ritala, M.⁶ Leskela, M.⁷

12
- 0036149532
- C.-C. Ting, S.-Y. Chen, and D.-M. Liu Thin Solid Films 102 2002 290
- (2002) Thin Solid Films , vol.102 , pp. 290
- Ting, C.-C.¹ Chen, S.-Y.² Liu, D.-M.³

13
- 0021510935
- P.M. Airtharaj, and F.H. Pollak Appl. Phys. Lett. 45 1984 789
- (1984) Appl. Phys. Lett. , vol.45 , pp. 789
- Airtharaj, P.M.¹ Pollak, F.H.²

14
- 0026124064
- A. Turkovic, M. Ivanda, A. Drasner, V. Vranesa, and M. Persin Thin Solid Films 198 1991 199
- (1991) Thin Solid Films , vol.198 , pp. 199
- Turkovic, A.¹ Ivanda, M.² Drasner, A.³ Vranesa, V.⁴ Persin, M.⁵

15
- 0028387893
- T.W. Kim, M. Jung, H.J. Kim, T.H. Park, Y.S. Yoon, W.N. Kang, S.S. Yom, and H.K. Na Appl. Phys. Lett. 64 1994 1407
- (1994) Appl. Phys. Lett. , vol.64 , pp. 1407
- Kim, T.W.¹ Jung, M.² Kim, H.J.³ Park, T.H.⁴ Yoon, Y.S.⁵ Kang, W.N.⁶ Yom, S.S.⁷ Na, H.K.⁸

16
- 4444279304
- Y.J. Chabal, M.K. Weldon, and V.E. Marsico J. Phys. IV. 6 1997
- (1997) J. Phys. IV. , vol.6
- Chabal, Y.J.¹ Weldon, M.K.² Marsico, V.E.³

17
- 0035898490
- L. Koltunski, and R.A.B. Devine Appl. Phys. Lett. 79 2001 320
- (2001) Appl. Phys. Lett. , vol.79 , pp. 320
- Koltunski, L.¹ Devine, R.A.B.²

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