Ultra-thin titanium oxide film with a rutile-type structure

Applied Surface Science

Volumn 207, Issue 1-4, 2003, Pages 13-19

  Hiratani, Masahiko ^a   Kadoshima, Masaru ^a   Hirano, Tatsumi ^a   Shimamoto, Yasuhiro ^a   Matsui, Yuichi ^a   Nabatame, Toshihide ^a   Torii, Kazuyoshi ^a   Kimura, Shinichiro ^a  

^a HITACHI LTD   (Japan)

Author keywords

Gate dielectric; High ; Rutile; TiO 2; Titanium oxide

Indexed keywords

CRYSTALLIZATION; DIELECTRIC MATERIALS; HEAT TREATMENT; MAGNETRON SPUTTERING; PHASE TRANSITIONS; STOICHIOMETRY; THERMODYNAMIC STABILITY; ULTRATHIN FILMS;

TITANIUM OXIDE FILMS;

TITANIUM OXIDES;

EID: 0037470505     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)01228-X     Document Type: Article

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