High vacuum chemical vapour deposition of oxides: A review of technique development and precursor selection

Surface and Coatings Technology

Volumn 230, Issue , 2013, Pages 13-21

  Kuzminykh, Yury ^a,b   Dabirian, Ali ^b   Reinke, Michael ^a,b   Hoffmann, Patrik ^a,b  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^b EPFL   (Switzerland)

Author keywords

High vacuum chemical vapour deposition; Oxides; Precursor delivery; Precursor efficiency; Thin films

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; DEPOSITION CHEMISTRY; INTERMOLECULAR COLLISIONS; LOW PRESSURE CHEMICAL VAPOUR DEPOSITIONS; PRECURSOR DECOMPOSITION; PRECURSOR DELIVERY; PROCESS OPTIMISATION; TECHNIQUE DEVELOPMENT;

DECOMPOSITION; DEPOSITION; DEPOSITION RATES; DIAMOND FILMS; EFFICIENCY; HAFNIUM OXIDES; MATERIALS; MOLECULAR BEAM EPITAXY; NIOBIUM; NIOBIUM OXIDE; OXIDES; SUBSTRATES; THIN FILMS; TITANIUM DIOXIDE; VAPORS;

CHEMICAL VAPOR DEPOSITION;

EID: 84881317445     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2013.06.059     Document Type: Article

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